Aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices

Abstract This work reports investigation on the deposition and evaluation of an aluminum-doped zinc oxide (AZO) thin film and its novel applications to micro- and nano-devices. The AZO thin film is deposited successfully by atomic layer deposition (ALD). 50 nm-thick AZO film with high uniformity is...

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Autores principales:	Nguyen Van Toan, Truong Thi Kim Tuoi, Naoki Inomata, Masaya Toda, Takahito Ono
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2021
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/664e172638ba48c185347b76944afc38
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spelling	oai:doaj.org-article:664e172638ba48c185347b76944afc382021-12-02T15:23:09ZAluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices10.1038/s41598-020-80880-32045-2322https://doaj.org/article/664e172638ba48c185347b76944afc382021-01-01T00:00:00Zhttps://doi.org/10.1038/s41598-020-80880-3https://doaj.org/toc/2045-2322Abstract This work reports investigation on the deposition and evaluation of an aluminum-doped zinc oxide (AZO) thin film and its novel applications to micro- and nano-devices. The AZO thin film is deposited successfully by atomic layer deposition (ALD). 50 nm-thick AZO film with high uniformity is checked by scanning electron microscopy. The element composition of the deposited film with various aluminum dopant concentration is analyzed by energy-dispersive X-ray spectroscopy. In addition, a polycrystalline feature of the deposited film is confirmed by selected area electron diffraction and high-resolution transmission electron microscopy. The lowest sheet resistance of the deposited AZO film is found at 0.7 kΩ/□ with the aluminum dopant concentration at 5 at.%. A novel method employed the ALD in combination with the sacrificial silicon structures is proposed which opens the way to create the ultra-high aspect ratio AZO structures. Moreover, based on this finding, three kinds of micro- and nano-devices employing the deposited AZO thin film have been proposed and demonstrated. Firstly, nanowalled micro-hollows with an aspect ratio of 300 and a height of 15 µm are successfully produced . Secondly, micro- and nano-fluidics, including a hollow fluidic channel with a nanowall structure as a resonator and a fluidic capillary window as an optical modulator is proposed and demonstrated. Lastly, nanomechanical resonators consisting of a bridged nanobeam structure and a vertical nanomechanical capacitive resonator are fabricated and evaluated.Nguyen Van ToanTruong Thi Kim TuoiNaoki InomataMasaya TodaTakahito OnoNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 11, Iss 1, Pp 1-12 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Medicine R Science Q
spellingShingle	Medicine R Science Q Nguyen Van Toan Truong Thi Kim Tuoi Naoki Inomata Masaya Toda Takahito Ono Aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices
description	Abstract This work reports investigation on the deposition and evaluation of an aluminum-doped zinc oxide (AZO) thin film and its novel applications to micro- and nano-devices. The AZO thin film is deposited successfully by atomic layer deposition (ALD). 50 nm-thick AZO film with high uniformity is checked by scanning electron microscopy. The element composition of the deposited film with various aluminum dopant concentration is analyzed by energy-dispersive X-ray spectroscopy. In addition, a polycrystalline feature of the deposited film is confirmed by selected area electron diffraction and high-resolution transmission electron microscopy. The lowest sheet resistance of the deposited AZO film is found at 0.7 kΩ/□ with the aluminum dopant concentration at 5 at.%. A novel method employed the ALD in combination with the sacrificial silicon structures is proposed which opens the way to create the ultra-high aspect ratio AZO structures. Moreover, based on this finding, three kinds of micro- and nano-devices employing the deposited AZO thin film have been proposed and demonstrated. Firstly, nanowalled micro-hollows with an aspect ratio of 300 and a height of 15 µm are successfully produced . Secondly, micro- and nano-fluidics, including a hollow fluidic channel with a nanowall structure as a resonator and a fluidic capillary window as an optical modulator is proposed and demonstrated. Lastly, nanomechanical resonators consisting of a bridged nanobeam structure and a vertical nanomechanical capacitive resonator are fabricated and evaluated.
format	article
author	Nguyen Van Toan Truong Thi Kim Tuoi Naoki Inomata Masaya Toda Takahito Ono
author_facet	Nguyen Van Toan Truong Thi Kim Tuoi Naoki Inomata Masaya Toda Takahito Ono
author_sort	Nguyen Van Toan
title	Aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices
title_short	Aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices
title_full	Aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices
title_fullStr	Aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices
title_full_unstemmed	Aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices
title_sort	aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices
publisher	Nature Portfolio
publishDate	2021
url	https://doaj.org/article/664e172638ba48c185347b76944afc38
work_keys_str_mv	AT nguyenvantoan aluminumdopedzincoxidedepositedbyatomiclayerdepositionanditsapplicationstomicronanodevices AT truongthikimtuoi aluminumdopedzincoxidedepositedbyatomiclayerdepositionanditsapplicationstomicronanodevices AT naokiinomata aluminumdopedzincoxidedepositedbyatomiclayerdepositionanditsapplicationstomicronanodevices AT masayatoda aluminumdopedzincoxidedepositedbyatomiclayerdepositionanditsapplicationstomicronanodevices AT takahitoono aluminumdopedzincoxidedepositedbyatomiclayerdepositionanditsapplicationstomicronanodevices
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Aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices

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