Hug, D., Zihlmann, S., Rehmann, M. K., Kalyoncu, Y. B., Camenzind, T. N., Marot, L., . . . Zumbühl, D. M. (2017). Anisotropic etching of graphite and graphene in a remote hydrogen plasma. Nature Portfolio.
Style de citation Chicago (17e éd.)Hug, D., S. Zihlmann, M. K. Rehmann, Y. B. Kalyoncu, T. N. Camenzind, L. Marot, K. Watanabe, T. Taniguchi, et D. M. Zumbühl. Anisotropic Etching of Graphite and Graphene in a Remote Hydrogen Plasma. Nature Portfolio, 2017.
Style de citation MLA (8e éd.)Hug, D., et al. Anisotropic Etching of Graphite and Graphene in a Remote Hydrogen Plasma. Nature Portfolio, 2017.
Attention : ces citations peuvent ne pas être correctes à 100%.