Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography

Extreme ultraviolet (EUV) light is entering use in nanolithography. Here the authors discuss experimental and theoretical results about the prominent role of multiply-excited states in highly charged tin ions in the mechanism of EUV light emission from laser-produced plasma.

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Autores principales:	F. Torretti, J. Sheil, R. Schupp, M. M. Basko, M. Bayraktar, R. A. Meijer, S. Witte, W. Ubachs, R. Hoekstra, O. O. Versolato, A. J. Neukirch, J. Colgan
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2020
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/6a95599c1e5e4450b7df90e19506645e
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spelling	oai:doaj.org-article:6a95599c1e5e4450b7df90e19506645e2021-12-02T15:36:11ZProminent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography10.1038/s41467-020-15678-y2041-1723https://doaj.org/article/6a95599c1e5e4450b7df90e19506645e2020-05-01T00:00:00Zhttps://doi.org/10.1038/s41467-020-15678-yhttps://doaj.org/toc/2041-1723Extreme ultraviolet (EUV) light is entering use in nanolithography. Here the authors discuss experimental and theoretical results about the prominent role of multiply-excited states in highly charged tin ions in the mechanism of EUV light emission from laser-produced plasma.F. TorrettiJ. SheilR. SchuppM. M. BaskoM. BayraktarR. A. MeijerS. WitteW. UbachsR. HoekstraO. O. VersolatoA. J. NeukirchJ. ColganNature PortfolioarticleScienceQENNature Communications, Vol 11, Iss 1, Pp 1-8 (2020)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q F. Torretti J. Sheil R. Schupp M. M. Basko M. Bayraktar R. A. Meijer S. Witte W. Ubachs R. Hoekstra O. O. Versolato A. J. Neukirch J. Colgan Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
description	Extreme ultraviolet (EUV) light is entering use in nanolithography. Here the authors discuss experimental and theoretical results about the prominent role of multiply-excited states in highly charged tin ions in the mechanism of EUV light emission from laser-produced plasma.
format	article
author	F. Torretti J. Sheil R. Schupp M. M. Basko M. Bayraktar R. A. Meijer S. Witte W. Ubachs R. Hoekstra O. O. Versolato A. J. Neukirch J. Colgan
author_facet	F. Torretti J. Sheil R. Schupp M. M. Basko M. Bayraktar R. A. Meijer S. Witte W. Ubachs R. Hoekstra O. O. Versolato A. J. Neukirch J. Colgan
author_sort	F. Torretti
title	Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
title_short	Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
title_full	Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
title_fullStr	Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
title_full_unstemmed	Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
title_sort	prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
publisher	Nature Portfolio
publishDate	2020
url	https://doaj.org/article/6a95599c1e5e4450b7df90e19506645e
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Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography

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