Ultrathin-metal-film-based transparent electrodes with relative transmittance surpassing 100%
Designing flexible and transparent electrodes for high-performance optoelectronic devices remains a challenge. Here, the authors presented conductive and flexible dielectric-metal-dielectric multi-layers electrodes based on Cu-doped Ag film (thickness of 6.5 nm) with 100.3% relative transmittance.
Guardado en:
Autores principales: | Chengang Ji, Dong Liu, Cheng Zhang, L. Jay Guo |
---|---|
Formato: | article |
Lenguaje: | EN |
Publicado: |
Nature Portfolio
2020
|
Materias: | |
Acceso en línea: | https://doaj.org/article/6c0113df2b724c6abaf44b81a6367f8f |
Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
Ejemplares similares
-
Persistent metallic Sn-doped In2O3 epitaxial ultrathin films with enhanced infrared transmittance
por: Dongha Kim, et al.
Publicado: (2020) -
Mechanical Properties of Nanoporous Metallic Ultrathin Films: A Paradigmatic Case
por: Giulio Benetti, et al.
Publicado: (2021) -
Nucleobases thin films deposited on nanostructured transparent conductive electrodes for optoelectronic applications
por: C. Breazu, et al.
Publicado: (2021) -
Vapor dealloying of ultra-thin films: a promising concept for the fabrication of highly flexible transparent conductive metal nanomesh electrodes
por: Adrien Chauvin, et al.
Publicado: (2019) -
A synergetic layered inorganic–organic hybrid film for conductive, flexible, and transparent electrodes
por: Devendra Singh, et al.
Publicado: (2019)