Atomic-Layer-Deposition Assisted Formation of Wafer-Scale Double-Layer Metal Nanoparticles with Tunable Nanogap for Surface-Enhanced Raman Scattering

Abstract A simple high-throughput approach is presented in this work to fabricate the Au nanoparticles (NPs)/nanogap/Au NPs structure for surface enhanced Raman scattering (SERS). This plasmonic nanostructure can be prepared feasibly by the combination of rapid thermal annealing (RTA), atomic layer...

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Autores principales: Yan-Qiang Cao, Kang Qin, Lin Zhu, Xu Qian, Xue-Jin Zhang, Di Wu, Ai-Dong Li
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Publicado: Nature Portfolio 2017
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Acceso en línea:https://doaj.org/article/6e968ae05ec84c25979afbde82f8391f
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spelling oai:doaj.org-article:6e968ae05ec84c25979afbde82f8391f2021-12-02T11:52:30ZAtomic-Layer-Deposition Assisted Formation of Wafer-Scale Double-Layer Metal Nanoparticles with Tunable Nanogap for Surface-Enhanced Raman Scattering10.1038/s41598-017-05533-42045-2322https://doaj.org/article/6e968ae05ec84c25979afbde82f8391f2017-07-01T00:00:00Zhttps://doi.org/10.1038/s41598-017-05533-4https://doaj.org/toc/2045-2322Abstract A simple high-throughput approach is presented in this work to fabricate the Au nanoparticles (NPs)/nanogap/Au NPs structure for surface enhanced Raman scattering (SERS). This plasmonic nanostructure can be prepared feasibly by the combination of rapid thermal annealing (RTA), atomic layer deposition (ALD) and chemical etching process. The nanogap size between Au NPs can be easily and precisely tuned to nanometer scale by adjusting the thickness of sacrificial ALD Al2O3 layer. Finite-difference time-domain (FDTD) simulation data indicate that most of enhanced field locates at Au NPs nanogap area. Moreover, Au NPs/nanogap/Au NPs structure with smaller gap exhibits the larger electromagnetic field. Experimental results agree well with FDTD simulation data, the plasmonic structure with smaller nanogap size has a stronger Raman intensity. There is highly strong plasmonic coupling in the Au nanogap, so that a great SERS effect is obtained when detecting methylene blue (MB) molecules with an enhancement factor (EF) over 107. Furthermore, this plasmonic nanostructure can be designed on large area with high density and high intensity hot spots. This strategy of producing nanoscale metal gap on large area has significant implications for ultrasensitive Raman detection and practical SERS application.Yan-Qiang CaoKang QinLin ZhuXu QianXue-Jin ZhangDi WuAi-Dong LiNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 7, Iss 1, Pp 1-8 (2017)
institution DOAJ
collection DOAJ
language EN
topic Medicine
R
Science
Q
spellingShingle Medicine
R
Science
Q
Yan-Qiang Cao
Kang Qin
Lin Zhu
Xu Qian
Xue-Jin Zhang
Di Wu
Ai-Dong Li
Atomic-Layer-Deposition Assisted Formation of Wafer-Scale Double-Layer Metal Nanoparticles with Tunable Nanogap for Surface-Enhanced Raman Scattering
description Abstract A simple high-throughput approach is presented in this work to fabricate the Au nanoparticles (NPs)/nanogap/Au NPs structure for surface enhanced Raman scattering (SERS). This plasmonic nanostructure can be prepared feasibly by the combination of rapid thermal annealing (RTA), atomic layer deposition (ALD) and chemical etching process. The nanogap size between Au NPs can be easily and precisely tuned to nanometer scale by adjusting the thickness of sacrificial ALD Al2O3 layer. Finite-difference time-domain (FDTD) simulation data indicate that most of enhanced field locates at Au NPs nanogap area. Moreover, Au NPs/nanogap/Au NPs structure with smaller gap exhibits the larger electromagnetic field. Experimental results agree well with FDTD simulation data, the plasmonic structure with smaller nanogap size has a stronger Raman intensity. There is highly strong plasmonic coupling in the Au nanogap, so that a great SERS effect is obtained when detecting methylene blue (MB) molecules with an enhancement factor (EF) over 107. Furthermore, this plasmonic nanostructure can be designed on large area with high density and high intensity hot spots. This strategy of producing nanoscale metal gap on large area has significant implications for ultrasensitive Raman detection and practical SERS application.
format article
author Yan-Qiang Cao
Kang Qin
Lin Zhu
Xu Qian
Xue-Jin Zhang
Di Wu
Ai-Dong Li
author_facet Yan-Qiang Cao
Kang Qin
Lin Zhu
Xu Qian
Xue-Jin Zhang
Di Wu
Ai-Dong Li
author_sort Yan-Qiang Cao
title Atomic-Layer-Deposition Assisted Formation of Wafer-Scale Double-Layer Metal Nanoparticles with Tunable Nanogap for Surface-Enhanced Raman Scattering
title_short Atomic-Layer-Deposition Assisted Formation of Wafer-Scale Double-Layer Metal Nanoparticles with Tunable Nanogap for Surface-Enhanced Raman Scattering
title_full Atomic-Layer-Deposition Assisted Formation of Wafer-Scale Double-Layer Metal Nanoparticles with Tunable Nanogap for Surface-Enhanced Raman Scattering
title_fullStr Atomic-Layer-Deposition Assisted Formation of Wafer-Scale Double-Layer Metal Nanoparticles with Tunable Nanogap for Surface-Enhanced Raman Scattering
title_full_unstemmed Atomic-Layer-Deposition Assisted Formation of Wafer-Scale Double-Layer Metal Nanoparticles with Tunable Nanogap for Surface-Enhanced Raman Scattering
title_sort atomic-layer-deposition assisted formation of wafer-scale double-layer metal nanoparticles with tunable nanogap for surface-enhanced raman scattering
publisher Nature Portfolio
publishDate 2017
url https://doaj.org/article/6e968ae05ec84c25979afbde82f8391f
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AT kangqin atomiclayerdepositionassistedformationofwaferscaledoublelayermetalnanoparticleswithtunablenanogapforsurfaceenhancedramanscattering
AT linzhu atomiclayerdepositionassistedformationofwaferscaledoublelayermetalnanoparticleswithtunablenanogapforsurfaceenhancedramanscattering
AT xuqian atomiclayerdepositionassistedformationofwaferscaledoublelayermetalnanoparticleswithtunablenanogapforsurfaceenhancedramanscattering
AT xuejinzhang atomiclayerdepositionassistedformationofwaferscaledoublelayermetalnanoparticleswithtunablenanogapforsurfaceenhancedramanscattering
AT diwu atomiclayerdepositionassistedformationofwaferscaledoublelayermetalnanoparticleswithtunablenanogapforsurfaceenhancedramanscattering
AT aidongli atomiclayerdepositionassistedformationofwaferscaledoublelayermetalnanoparticleswithtunablenanogapforsurfaceenhancedramanscattering
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