Titanium Nitride as a Plasmonic Material from Near-Ultraviolet to Very-Long-Wavelength Infrared Range

Titanium nitride is a well-known conductive ceramic material that has recently experienced resumed attention because of its plasmonic properties comparable to metallic gold and silver. Thus, TiN is an attractive alternative for modern and future photonic applications that require compatibility with...

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Autores principales:	Jarosław Judek, Piotr Wróbel, Paweł Piotr Michałowski, Monika Ożga, Bartłomiej Witkowski, Aleksandra Seweryn, Michał Struzik, Cezariusz Jastrzębski, Krzysztof Zberecki
Formato:	article
Lenguaje:	EN
Publicado:	MDPI AG 2021
Materias:	photonics plasmonics titanium nitride infrared range Technology T Electrical engineering. Electronics. Nuclear engineering TK1-9971 Engineering (General). Civil engineering (General) TA1-2040 Microscopy QH201-278.5 Descriptive and experimental mechanics QC120-168.85
Acceso en línea:	https://doaj.org/article/7508fb62ee204d1c8181598ef090d9fe
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spelling	oai:doaj.org-article:7508fb62ee204d1c8181598ef090d9fe2021-11-25T18:16:17ZTitanium Nitride as a Plasmonic Material from Near-Ultraviolet to Very-Long-Wavelength Infrared Range10.3390/ma142270951996-1944https://doaj.org/article/7508fb62ee204d1c8181598ef090d9fe2021-11-01T00:00:00Zhttps://www.mdpi.com/1996-1944/14/22/7095https://doaj.org/toc/1996-1944Titanium nitride is a well-known conductive ceramic material that has recently experienced resumed attention because of its plasmonic properties comparable to metallic gold and silver. Thus, TiN is an attractive alternative for modern and future photonic applications that require compatibility with the Complementary Metal-Oxide-Semiconductor (CMOS) technology or improved resistance to temperatures or radiation. This work demonstrates that polycrystalline TiN<i><sub>x</sub></i> films sputtered on silicon at room temperature can exhibit plasmonic properties continuously from 400 nm up to 30 μm. The films’ composition, expressed as nitrogen to titanium ratio x and determined in the Secondary Ion Mass Spectroscopy (SIMS) experiment to be in the range of 0.84 to 1.21, is essential for optimizing the plasmonic properties. In the visible range, the dielectric function renders the interband optical transitions. For wavelengths longer than 800 nm, the optical properties of TiN<i><sub>x</sub></i> are well described by the Drude model modified by an additional Lorentz term, which has to be included for part of the samples. The ab initio calculations support the experimental results both in the visible and infra-red ranges; particularly, the existence of a very low energy optical transition is predicted. Some other minor features in the dielectric function observed for the longest wavelengths are suspected to be of phonon origin.Jarosław JudekPiotr WróbelPaweł Piotr MichałowskiMonika OżgaBartłomiej WitkowskiAleksandra SewerynMichał StruzikCezariusz JastrzębskiKrzysztof ZbereckiMDPI AGarticlephotonicsplasmonicstitanium nitrideinfrared rangeTechnologyTElectrical engineering. Electronics. Nuclear engineeringTK1-9971Engineering (General). Civil engineering (General)TA1-2040MicroscopyQH201-278.5Descriptive and experimental mechanicsQC120-168.85ENMaterials, Vol 14, Iss 7095, p 7095 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	photonics plasmonics titanium nitride infrared range Technology T Electrical engineering. Electronics. Nuclear engineering TK1-9971 Engineering (General). Civil engineering (General) TA1-2040 Microscopy QH201-278.5 Descriptive and experimental mechanics QC120-168.85
spellingShingle	photonics plasmonics titanium nitride infrared range Technology T Electrical engineering. Electronics. Nuclear engineering TK1-9971 Engineering (General). Civil engineering (General) TA1-2040 Microscopy QH201-278.5 Descriptive and experimental mechanics QC120-168.85 Jarosław Judek Piotr Wróbel Paweł Piotr Michałowski Monika Ożga Bartłomiej Witkowski Aleksandra Seweryn Michał Struzik Cezariusz Jastrzębski Krzysztof Zberecki Titanium Nitride as a Plasmonic Material from Near-Ultraviolet to Very-Long-Wavelength Infrared Range
description	Titanium nitride is a well-known conductive ceramic material that has recently experienced resumed attention because of its plasmonic properties comparable to metallic gold and silver. Thus, TiN is an attractive alternative for modern and future photonic applications that require compatibility with the Complementary Metal-Oxide-Semiconductor (CMOS) technology or improved resistance to temperatures or radiation. This work demonstrates that polycrystalline TiN<i><sub>x</sub></i> films sputtered on silicon at room temperature can exhibit plasmonic properties continuously from 400 nm up to 30 μm. The films’ composition, expressed as nitrogen to titanium ratio x and determined in the Secondary Ion Mass Spectroscopy (SIMS) experiment to be in the range of 0.84 to 1.21, is essential for optimizing the plasmonic properties. In the visible range, the dielectric function renders the interband optical transitions. For wavelengths longer than 800 nm, the optical properties of TiN<i><sub>x</sub></i> are well described by the Drude model modified by an additional Lorentz term, which has to be included for part of the samples. The ab initio calculations support the experimental results both in the visible and infra-red ranges; particularly, the existence of a very low energy optical transition is predicted. Some other minor features in the dielectric function observed for the longest wavelengths are suspected to be of phonon origin.
format	article
author	Jarosław Judek Piotr Wróbel Paweł Piotr Michałowski Monika Ożga Bartłomiej Witkowski Aleksandra Seweryn Michał Struzik Cezariusz Jastrzębski Krzysztof Zberecki
author_facet	Jarosław Judek Piotr Wróbel Paweł Piotr Michałowski Monika Ożga Bartłomiej Witkowski Aleksandra Seweryn Michał Struzik Cezariusz Jastrzębski Krzysztof Zberecki
author_sort	Jarosław Judek
title	Titanium Nitride as a Plasmonic Material from Near-Ultraviolet to Very-Long-Wavelength Infrared Range
title_short	Titanium Nitride as a Plasmonic Material from Near-Ultraviolet to Very-Long-Wavelength Infrared Range
title_full	Titanium Nitride as a Plasmonic Material from Near-Ultraviolet to Very-Long-Wavelength Infrared Range
title_fullStr	Titanium Nitride as a Plasmonic Material from Near-Ultraviolet to Very-Long-Wavelength Infrared Range
title_full_unstemmed	Titanium Nitride as a Plasmonic Material from Near-Ultraviolet to Very-Long-Wavelength Infrared Range
title_sort	titanium nitride as a plasmonic material from near-ultraviolet to very-long-wavelength infrared range
publisher	MDPI AG
publishDate	2021
url	https://doaj.org/article/7508fb62ee204d1c8181598ef090d9fe
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Titanium Nitride as a Plasmonic Material from Near-Ultraviolet to Very-Long-Wavelength Infrared Range

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