Suppression of atom motion and metal deposition in mixed ionic electronic conductors
Mixed ionic–electronic conductors are limited by material decomposition. Here the authors reveal the mechanism for atom migration and deposition in Cu2–δ (S,Se) materials based on a critical chemical potential difference and propose electronically conducting, ion-blocking interfaces to enhance stabi...
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| Auteurs principaux: | , , , , , , , , , , , , , , |
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| Format: | article |
| Langue: | EN |
| Publié: |
Nature Portfolio
2018
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| Sujets: | |
| Accès en ligne: | https://doaj.org/article/75e341a85b2c4256bb22d261aab61ef7 |
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| Résumé: | Mixed ionic–electronic conductors are limited by material decomposition. Here the authors reveal the mechanism for atom migration and deposition in Cu2–δ (S,Se) materials based on a critical chemical potential difference and propose electronically conducting, ion-blocking interfaces to enhance stability. |
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