Suppression of atom motion and metal deposition in mixed ionic electronic conductors

Mixed ionic–electronic conductors are limited by material decomposition. Here the authors reveal the mechanism for atom migration and deposition in Cu2–δ (S,Se) materials based on a critical chemical potential difference and propose electronically conducting, ion-blocking interfaces to enhance stabi...

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Autores principales:	Pengfei Qiu, Matthias T. Agne, Yongying Liu, Yaqin Zhu, Hongyi Chen, Tao Mao, Jiong Yang, Wenqing Zhang, Sossina M. Haile, Wolfgang G. Zeier, Jürgen Janek, Ctirad Uher, Xun Shi, Lidong Chen, G. Jeffrey Snyder
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2018
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/75e341a85b2c4256bb22d261aab61ef7
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spelling	oai:doaj.org-article:75e341a85b2c4256bb22d261aab61ef72021-12-02T14:39:46ZSuppression of atom motion and metal deposition in mixed ionic electronic conductors10.1038/s41467-018-05248-82041-1723https://doaj.org/article/75e341a85b2c4256bb22d261aab61ef72018-07-01T00:00:00Zhttps://doi.org/10.1038/s41467-018-05248-8https://doaj.org/toc/2041-1723Mixed ionic–electronic conductors are limited by material decomposition. Here the authors reveal the mechanism for atom migration and deposition in Cu2–δ (S,Se) materials based on a critical chemical potential difference and propose electronically conducting, ion-blocking interfaces to enhance stability.Pengfei QiuMatthias T. AgneYongying LiuYaqin ZhuHongyi ChenTao MaoJiong YangWenqing ZhangSossina M. HaileWolfgang G. ZeierJürgen JanekCtirad UherXun ShiLidong ChenG. Jeffrey SnyderNature PortfolioarticleScienceQENNature Communications, Vol 9, Iss 1, Pp 1-8 (2018)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q Pengfei Qiu Matthias T. Agne Yongying Liu Yaqin Zhu Hongyi Chen Tao Mao Jiong Yang Wenqing Zhang Sossina M. Haile Wolfgang G. Zeier Jürgen Janek Ctirad Uher Xun Shi Lidong Chen G. Jeffrey Snyder Suppression of atom motion and metal deposition in mixed ionic electronic conductors
description	Mixed ionic–electronic conductors are limited by material decomposition. Here the authors reveal the mechanism for atom migration and deposition in Cu2–δ (S,Se) materials based on a critical chemical potential difference and propose electronically conducting, ion-blocking interfaces to enhance stability.
format	article
author	Pengfei Qiu Matthias T. Agne Yongying Liu Yaqin Zhu Hongyi Chen Tao Mao Jiong Yang Wenqing Zhang Sossina M. Haile Wolfgang G. Zeier Jürgen Janek Ctirad Uher Xun Shi Lidong Chen G. Jeffrey Snyder
author_facet	Pengfei Qiu Matthias T. Agne Yongying Liu Yaqin Zhu Hongyi Chen Tao Mao Jiong Yang Wenqing Zhang Sossina M. Haile Wolfgang G. Zeier Jürgen Janek Ctirad Uher Xun Shi Lidong Chen G. Jeffrey Snyder
author_sort	Pengfei Qiu
title	Suppression of atom motion and metal deposition in mixed ionic electronic conductors
title_short	Suppression of atom motion and metal deposition in mixed ionic electronic conductors
title_full	Suppression of atom motion and metal deposition in mixed ionic electronic conductors
title_fullStr	Suppression of atom motion and metal deposition in mixed ionic electronic conductors
title_full_unstemmed	Suppression of atom motion and metal deposition in mixed ionic electronic conductors
title_sort	suppression of atom motion and metal deposition in mixed ionic electronic conductors
publisher	Nature Portfolio
publishDate	2018
url	https://doaj.org/article/75e341a85b2c4256bb22d261aab61ef7
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_version_	1718390537888727040

Suppression of atom motion and metal deposition in mixed ionic electronic conductors

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