Strain Balanced AlGaN/GaN/AlGaN nanomembrane HEMTs

Abstract Single crystal semiconductor nanomembranes (NM) are important in various applications such as heterogeneous integration and flexible devices. This paper reports the fabrication of AlGaN/GaN NMs and NM high electron mobility transistors (HEMT). Electrochemical etching is used to slice off si...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Tzu-Hsuan Chang, Kanglin Xiong, Sung Hyun Park, Ge Yuan, Zhenqiang Ma, Jung Han
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2017
Materias:
R
Q
Acceso en línea:https://doaj.org/article/78b17a0546e242209a1dd0f8ba3b4206
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
id oai:doaj.org-article:78b17a0546e242209a1dd0f8ba3b4206
record_format dspace
spelling oai:doaj.org-article:78b17a0546e242209a1dd0f8ba3b42062021-12-02T11:53:01ZStrain Balanced AlGaN/GaN/AlGaN nanomembrane HEMTs10.1038/s41598-017-06957-82045-2322https://doaj.org/article/78b17a0546e242209a1dd0f8ba3b42062017-07-01T00:00:00Zhttps://doi.org/10.1038/s41598-017-06957-8https://doaj.org/toc/2045-2322Abstract Single crystal semiconductor nanomembranes (NM) are important in various applications such as heterogeneous integration and flexible devices. This paper reports the fabrication of AlGaN/GaN NMs and NM high electron mobility transistors (HEMT). Electrochemical etching is used to slice off single-crystalline AlGaN/GaN layers while preserving their microstructural quality. A double heterostructure design with a symmetric strain profile is employed to ensure minimal residual strain in freestanding NMs after release. The mobility of the two-dimensional electron gas (2DEG), formed by the AlGaN/GaN heterostructure, is noticeably superior to previously reported values of many other NMs. AlGaN/GaN nanomembrane HEMTs are fabricated on SiO2 and flexible polymeric substrates. Excellent electrical characteristics, including a high ON/OFF ratio and transconductance, suggest that III-Nitrides nanomembranes are capable of supporting high performance applications.Tzu-Hsuan ChangKanglin XiongSung Hyun ParkGe YuanZhenqiang MaJung HanNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 7, Iss 1, Pp 1-9 (2017)
institution DOAJ
collection DOAJ
language EN
topic Medicine
R
Science
Q
spellingShingle Medicine
R
Science
Q
Tzu-Hsuan Chang
Kanglin Xiong
Sung Hyun Park
Ge Yuan
Zhenqiang Ma
Jung Han
Strain Balanced AlGaN/GaN/AlGaN nanomembrane HEMTs
description Abstract Single crystal semiconductor nanomembranes (NM) are important in various applications such as heterogeneous integration and flexible devices. This paper reports the fabrication of AlGaN/GaN NMs and NM high electron mobility transistors (HEMT). Electrochemical etching is used to slice off single-crystalline AlGaN/GaN layers while preserving their microstructural quality. A double heterostructure design with a symmetric strain profile is employed to ensure minimal residual strain in freestanding NMs after release. The mobility of the two-dimensional electron gas (2DEG), formed by the AlGaN/GaN heterostructure, is noticeably superior to previously reported values of many other NMs. AlGaN/GaN nanomembrane HEMTs are fabricated on SiO2 and flexible polymeric substrates. Excellent electrical characteristics, including a high ON/OFF ratio and transconductance, suggest that III-Nitrides nanomembranes are capable of supporting high performance applications.
format article
author Tzu-Hsuan Chang
Kanglin Xiong
Sung Hyun Park
Ge Yuan
Zhenqiang Ma
Jung Han
author_facet Tzu-Hsuan Chang
Kanglin Xiong
Sung Hyun Park
Ge Yuan
Zhenqiang Ma
Jung Han
author_sort Tzu-Hsuan Chang
title Strain Balanced AlGaN/GaN/AlGaN nanomembrane HEMTs
title_short Strain Balanced AlGaN/GaN/AlGaN nanomembrane HEMTs
title_full Strain Balanced AlGaN/GaN/AlGaN nanomembrane HEMTs
title_fullStr Strain Balanced AlGaN/GaN/AlGaN nanomembrane HEMTs
title_full_unstemmed Strain Balanced AlGaN/GaN/AlGaN nanomembrane HEMTs
title_sort strain balanced algan/gan/algan nanomembrane hemts
publisher Nature Portfolio
publishDate 2017
url https://doaj.org/article/78b17a0546e242209a1dd0f8ba3b4206
work_keys_str_mv AT tzuhsuanchang strainbalancedalganganalgannanomembranehemts
AT kanglinxiong strainbalancedalganganalgannanomembranehemts
AT sunghyunpark strainbalancedalganganalgannanomembranehemts
AT geyuan strainbalancedalganganalgannanomembranehemts
AT zhenqiangma strainbalancedalganganalgannanomembranehemts
AT junghan strainbalancedalganganalgannanomembranehemts
_version_ 1718394934285828096