Ultrahigh-Q optomechanical crystal cavities fabricated in a CMOS foundry

Abstract Photonic crystals use periodic structures to create frequency regions where the optical wave propagation is forbidden, which allows the creation and integration of complex optical functionalities in small footprint devices. Such strategy has also been successfully applied to confine mechani...

Descripción completa

Guardado en:

Detalles Bibliográficos
Autores principales:	Rodrigo Benevides, Felipe G. S. Santos, Gustavo O. Luiz, Gustavo S. Wiederhecker, Thiago P. Mayer Alegre
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2017
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/791e9467497c41e2a960f8782c8cb5d0
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

id	oai:doaj.org-article:791e9467497c41e2a960f8782c8cb5d0
record_format	dspace
spelling	oai:doaj.org-article:791e9467497c41e2a960f8782c8cb5d02021-12-02T15:05:22ZUltrahigh-Q optomechanical crystal cavities fabricated in a CMOS foundry10.1038/s41598-017-02515-42045-2322https://doaj.org/article/791e9467497c41e2a960f8782c8cb5d02017-05-01T00:00:00Zhttps://doi.org/10.1038/s41598-017-02515-4https://doaj.org/toc/2045-2322Abstract Photonic crystals use periodic structures to create frequency regions where the optical wave propagation is forbidden, which allows the creation and integration of complex optical functionalities in small footprint devices. Such strategy has also been successfully applied to confine mechanical waves and to explore their interaction with light in the so-called optomechanical cavities. Because of their challenging design, these cavities are traditionally fabricated using dedicated high-resolution electron-beam lithography tools that are inherently slow, limiting this solution to small-scale or research applications. Here we show how to overcome this problem by using a deep-UV photolithography process to fabricate optomechanical crystals in a commercial CMOS foundry. We show that a careful design of the photonic crystals can withstand the limitations of the photolithography process, producing cavities with measured intrinsic optical quality factors as high as Q i = (1.21 ± 0.02) × 106. Optomechanical crystals are also created using phononic crystals to tightly confine the GHz sound waves within the optical cavity, resulting in a measured vacuum optomechanical coupling rate of g 0 = 2π × (91 ± 4) kHz. Efficient sideband cooling and amplification are also demonstrated since these cavities are in the resolved sideband regime. Further improvements in the design and fabrication process suggest that commercial foundry-based optomechanical cavities could be used for quantum ground-state cooling.Rodrigo BenevidesFelipe G. S. SantosGustavo O. LuizGustavo S. WiederheckerThiago P. Mayer AlegreNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 7, Iss 1, Pp 1-6 (2017)
institution	DOAJ
collection	DOAJ
language	EN
topic	Medicine R Science Q
spellingShingle	Medicine R Science Q Rodrigo Benevides Felipe G. S. Santos Gustavo O. Luiz Gustavo S. Wiederhecker Thiago P. Mayer Alegre Ultrahigh-Q optomechanical crystal cavities fabricated in a CMOS foundry
description	Abstract Photonic crystals use periodic structures to create frequency regions where the optical wave propagation is forbidden, which allows the creation and integration of complex optical functionalities in small footprint devices. Such strategy has also been successfully applied to confine mechanical waves and to explore their interaction with light in the so-called optomechanical cavities. Because of their challenging design, these cavities are traditionally fabricated using dedicated high-resolution electron-beam lithography tools that are inherently slow, limiting this solution to small-scale or research applications. Here we show how to overcome this problem by using a deep-UV photolithography process to fabricate optomechanical crystals in a commercial CMOS foundry. We show that a careful design of the photonic crystals can withstand the limitations of the photolithography process, producing cavities with measured intrinsic optical quality factors as high as Q i = (1.21 ± 0.02) × 106. Optomechanical crystals are also created using phononic crystals to tightly confine the GHz sound waves within the optical cavity, resulting in a measured vacuum optomechanical coupling rate of g 0 = 2π × (91 ± 4) kHz. Efficient sideband cooling and amplification are also demonstrated since these cavities are in the resolved sideband regime. Further improvements in the design and fabrication process suggest that commercial foundry-based optomechanical cavities could be used for quantum ground-state cooling.
format	article
author	Rodrigo Benevides Felipe G. S. Santos Gustavo O. Luiz Gustavo S. Wiederhecker Thiago P. Mayer Alegre
author_facet	Rodrigo Benevides Felipe G. S. Santos Gustavo O. Luiz Gustavo S. Wiederhecker Thiago P. Mayer Alegre
author_sort	Rodrigo Benevides
title	Ultrahigh-Q optomechanical crystal cavities fabricated in a CMOS foundry
title_short	Ultrahigh-Q optomechanical crystal cavities fabricated in a CMOS foundry
title_full	Ultrahigh-Q optomechanical crystal cavities fabricated in a CMOS foundry
title_fullStr	Ultrahigh-Q optomechanical crystal cavities fabricated in a CMOS foundry
title_full_unstemmed	Ultrahigh-Q optomechanical crystal cavities fabricated in a CMOS foundry
title_sort	ultrahigh-q optomechanical crystal cavities fabricated in a cmos foundry
publisher	Nature Portfolio
publishDate	2017
url	https://doaj.org/article/791e9467497c41e2a960f8782c8cb5d0
work_keys_str_mv	AT rodrigobenevides ultrahighqoptomechanicalcrystalcavitiesfabricatedinacmosfoundry AT felipegssantos ultrahighqoptomechanicalcrystalcavitiesfabricatedinacmosfoundry AT gustavooluiz ultrahighqoptomechanicalcrystalcavitiesfabricatedinacmosfoundry AT gustavoswiederhecker ultrahighqoptomechanicalcrystalcavitiesfabricatedinacmosfoundry AT thiagopmayeralegre ultrahighqoptomechanicalcrystalcavitiesfabricatedinacmosfoundry
_version_	1718388840037613568

Ultrahigh-Q optomechanical crystal cavities fabricated in a CMOS foundry

Ejemplares similares