Crossing the threshold of ultrafast laser writing in bulk silicon

Ultrafast laser processing is a versatile three-dimensional photonic structuring method but it has been limited to wide band gap materials like glasses. Here, Chanal et al. demonstrate direct refractive-index modification in the bulk of silicon by extreme localization of the energy deposition.

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Autores principales:	Margaux Chanal, Vladimir Yu. Fedorov, Maxime Chambonneau, Raphaël Clady, Stelios Tzortzakis, David Grojo
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2017
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/7ccda1285b2345f9a690836765d1eda0
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spelling	oai:doaj.org-article:7ccda1285b2345f9a690836765d1eda02021-12-02T14:42:34ZCrossing the threshold of ultrafast laser writing in bulk silicon10.1038/s41467-017-00907-82041-1723https://doaj.org/article/7ccda1285b2345f9a690836765d1eda02017-10-01T00:00:00Zhttps://doi.org/10.1038/s41467-017-00907-8https://doaj.org/toc/2041-1723Ultrafast laser processing is a versatile three-dimensional photonic structuring method but it has been limited to wide band gap materials like glasses. Here, Chanal et al. demonstrate direct refractive-index modification in the bulk of silicon by extreme localization of the energy deposition.Margaux ChanalVladimir Yu. FedorovMaxime ChambonneauRaphaël CladyStelios TzortzakisDavid GrojoNature PortfolioarticleScienceQENNature Communications, Vol 8, Iss 1, Pp 1-6 (2017)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q Margaux Chanal Vladimir Yu. Fedorov Maxime Chambonneau Raphaël Clady Stelios Tzortzakis David Grojo Crossing the threshold of ultrafast laser writing in bulk silicon
description	Ultrafast laser processing is a versatile three-dimensional photonic structuring method but it has been limited to wide band gap materials like glasses. Here, Chanal et al. demonstrate direct refractive-index modification in the bulk of silicon by extreme localization of the energy deposition.
format	article
author	Margaux Chanal Vladimir Yu. Fedorov Maxime Chambonneau Raphaël Clady Stelios Tzortzakis David Grojo
author_facet	Margaux Chanal Vladimir Yu. Fedorov Maxime Chambonneau Raphaël Clady Stelios Tzortzakis David Grojo
author_sort	Margaux Chanal
title	Crossing the threshold of ultrafast laser writing in bulk silicon
title_short	Crossing the threshold of ultrafast laser writing in bulk silicon
title_full	Crossing the threshold of ultrafast laser writing in bulk silicon
title_fullStr	Crossing the threshold of ultrafast laser writing in bulk silicon
title_full_unstemmed	Crossing the threshold of ultrafast laser writing in bulk silicon
title_sort	crossing the threshold of ultrafast laser writing in bulk silicon
publisher	Nature Portfolio
publishDate	2017
url	https://doaj.org/article/7ccda1285b2345f9a690836765d1eda0
work_keys_str_mv	AT margauxchanal crossingthethresholdofultrafastlaserwritinginbulksilicon AT vladimiryufedorov crossingthethresholdofultrafastlaserwritinginbulksilicon AT maximechambonneau crossingthethresholdofultrafastlaserwritinginbulksilicon AT raphaelclady crossingthethresholdofultrafastlaserwritinginbulksilicon AT steliostzortzakis crossingthethresholdofultrafastlaserwritinginbulksilicon AT davidgrojo crossingthethresholdofultrafastlaserwritinginbulksilicon
_version_	1718389637916917760

Crossing the threshold of ultrafast laser writing in bulk silicon

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