Relaxation processes under microindentation of InP crystals subjected to scratching deformation

The elastic strain relaxation was estimated by the use of the method of acoustic emis- sion signal registration under microindentation. The coefficient K for the estimation of relaxation degree under unloading was introduced. The preliminary strain degree of InP single crystals and accordingly the...

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Autores principales:	Jitaru, Raisa, Rahvalov, Veaceslav
Formato:	article
Lenguaje:	EN
Publicado:	D.Ghitu Institute of Electronic Engineering and Nanotechnologies 2006
Materias:	Physics QC1-999 Electronics TK7800-8360
Acceso en línea:	https://doaj.org/article/85b02724a0fb428fb731b456fb910f30
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spelling	oai:doaj.org-article:85b02724a0fb428fb731b456fb910f302021-11-21T12:08:57ZRelaxation processes under microindentation of InP crystals subjected to scratching deformation 2537-63651810-648Xhttps://doaj.org/article/85b02724a0fb428fb731b456fb910f302006-12-01T00:00:00Zhttps://mjps.nanotech.md/archive/2006/article/3520https://doaj.org/toc/1810-648Xhttps://doaj.org/toc/2537-6365The elastic strain relaxation was estimated by the use of the method of acoustic emis- sion signal registration under microindentation. The coefficient K for the estimation of relaxation degree under unloading was introduced. The preliminary strain degree of InP single crystals and accordingly the internal stresses were varied by the scratching method as well as by the testing temperature (293÷723 K) and storage of predeformed crystals at room temperature. It was shown that the relaxation processes are determined by the stress defect structure state and are the predeformation temperature function. These processes are tightly related to the internal strain stress, characterizing the start state of InP single crystals. Jitaru, RaisaRahvalov, VeaceslavD.Ghitu Institute of Electronic Engineering and NanotechnologiesarticlePhysicsQC1-999ElectronicsTK7800-8360ENMoldavian Journal of the Physical Sciences, Vol 5, Iss 3-4, Pp 298-303 (2006)
institution	DOAJ
collection	DOAJ
language	EN
topic	Physics QC1-999 Electronics TK7800-8360
spellingShingle	Physics QC1-999 Electronics TK7800-8360 Jitaru, Raisa Rahvalov, Veaceslav Relaxation processes under microindentation of InP crystals subjected to scratching deformation
description	The elastic strain relaxation was estimated by the use of the method of acoustic emis- sion signal registration under microindentation. The coefficient K for the estimation of relaxation degree under unloading was introduced. The preliminary strain degree of InP single crystals and accordingly the internal stresses were varied by the scratching method as well as by the testing temperature (293÷723 K) and storage of predeformed crystals at room temperature. It was shown that the relaxation processes are determined by the stress defect structure state and are the predeformation temperature function. These processes are tightly related to the internal strain stress, characterizing the start state of InP single crystals.
format	article
author	Jitaru, Raisa Rahvalov, Veaceslav
author_facet	Jitaru, Raisa Rahvalov, Veaceslav
author_sort	Jitaru, Raisa
title	Relaxation processes under microindentation of InP crystals subjected to scratching deformation
title_short	Relaxation processes under microindentation of InP crystals subjected to scratching deformation
title_full	Relaxation processes under microindentation of InP crystals subjected to scratching deformation
title_fullStr	Relaxation processes under microindentation of InP crystals subjected to scratching deformation
title_full_unstemmed	Relaxation processes under microindentation of InP crystals subjected to scratching deformation
title_sort	relaxation processes under microindentation of inp crystals subjected to scratching deformation
publisher	D.Ghitu Institute of Electronic Engineering and Nanotechnologies
publishDate	2006
url	https://doaj.org/article/85b02724a0fb428fb731b456fb910f30
work_keys_str_mv	AT jitaruraisa relaxationprocessesundermicroindentationofinpcrystalssubjectedtoscratchingdeformation AT rahvalovveaceslav relaxationprocessesundermicroindentationofinpcrystalssubjectedtoscratchingdeformation
_version_	1718419197143285760

Relaxation processes under microindentation of InP crystals subjected to scratching deformation

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