High-resolution stereolithography using a static liquid constrained interface

Stiction between polymerized layers and the constraining solid interface during stereolithography limits resolution. Here, a static inert liquid is used as a constraining interface to mitigate stiction, enabling high resolution parts to be fabricated with feature sizes spanning tens to thousands of...

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Auteurs principaux:	Aftab A. Bhanvadia, Richard T. Farley, Youngwook Noh, Toshikazu Nishida
Format:	article
Langue:	EN
Publié:	Nature Portfolio 2021
Sujets:	Materials of engineering and construction. Mechanics of materials TA401-492
Accès en ligne:	https://doaj.org/article/88baa715a2cf46aa971b6883ac8bcf96
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spelling	oai:doaj.org-article:88baa715a2cf46aa971b6883ac8bcf962021-12-02T18:15:35ZHigh-resolution stereolithography using a static liquid constrained interface10.1038/s43246-021-00145-y2662-4443https://doaj.org/article/88baa715a2cf46aa971b6883ac8bcf962021-04-01T00:00:00Zhttps://doi.org/10.1038/s43246-021-00145-yhttps://doaj.org/toc/2662-4443Stiction between polymerized layers and the constraining solid interface during stereolithography limits resolution. Here, a static inert liquid is used as a constraining interface to mitigate stiction, enabling high resolution parts to be fabricated with feature sizes spanning tens to thousands of microns.Aftab A. BhanvadiaRichard T. FarleyYoungwook NohToshikazu NishidaNature PortfolioarticleMaterials of engineering and construction. Mechanics of materialsTA401-492ENCommunications Materials, Vol 2, Iss 1, Pp 1-7 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Materials of engineering and construction. Mechanics of materials TA401-492
spellingShingle	Materials of engineering and construction. Mechanics of materials TA401-492 Aftab A. Bhanvadia Richard T. Farley Youngwook Noh Toshikazu Nishida High-resolution stereolithography using a static liquid constrained interface
description	Stiction between polymerized layers and the constraining solid interface during stereolithography limits resolution. Here, a static inert liquid is used as a constraining interface to mitigate stiction, enabling high resolution parts to be fabricated with feature sizes spanning tens to thousands of microns.
format	article
author	Aftab A. Bhanvadia Richard T. Farley Youngwook Noh Toshikazu Nishida
author_facet	Aftab A. Bhanvadia Richard T. Farley Youngwook Noh Toshikazu Nishida
author_sort	Aftab A. Bhanvadia
title	High-resolution stereolithography using a static liquid constrained interface
title_short	High-resolution stereolithography using a static liquid constrained interface
title_full	High-resolution stereolithography using a static liquid constrained interface
title_fullStr	High-resolution stereolithography using a static liquid constrained interface
title_full_unstemmed	High-resolution stereolithography using a static liquid constrained interface
title_sort	high-resolution stereolithography using a static liquid constrained interface
publisher	Nature Portfolio
publishDate	2021
url	https://doaj.org/article/88baa715a2cf46aa971b6883ac8bcf96
work_keys_str_mv	AT aftababhanvadia highresolutionstereolithographyusingastaticliquidconstrainedinterface AT richardtfarley highresolutionstereolithographyusingastaticliquidconstrainedinterface AT youngwooknoh highresolutionstereolithographyusingastaticliquidconstrainedinterface AT toshikazunishida highresolutionstereolithographyusingastaticliquidconstrainedinterface
_version_	1718378344156758016

High-resolution stereolithography using a static liquid constrained interface

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