Vapor–liquid–solid growth of large-area multilayer hexagonal boron nitride on dielectric substrates

Multilayer hexagonal boron nitride (hBN) is a desirable dielectric substrate for 2D electronics but its controllable synthesis is challenging. Here, the authors report a vapor–liquid–solid growth method to achieve uniform multilayer hBN by using a molten Fe82B18 alloy and N2 as reactants.

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Auteurs principaux: Zhiyuan Shi, Xiujun Wang, Qingtian Li, Peng Yang, Guangyuan Lu, Ren Jiang, Huishan Wang, Chao Zhang, Chunxiao Cong, Zhi Liu, Tianru Wu, Haomin Wang, Qingkai Yu, Xiaoming Xie
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Publié: Nature Portfolio 2020
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Accès en ligne:https://doaj.org/article/8e4c858c9fc64e1589e0bca0ae54187e
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spelling oai:doaj.org-article:8e4c858c9fc64e1589e0bca0ae54187e2021-12-02T16:50:00ZVapor–liquid–solid growth of large-area multilayer hexagonal boron nitride on dielectric substrates10.1038/s41467-020-14596-32041-1723https://doaj.org/article/8e4c858c9fc64e1589e0bca0ae54187e2020-02-01T00:00:00Zhttps://doi.org/10.1038/s41467-020-14596-3https://doaj.org/toc/2041-1723Multilayer hexagonal boron nitride (hBN) is a desirable dielectric substrate for 2D electronics but its controllable synthesis is challenging. Here, the authors report a vapor–liquid–solid growth method to achieve uniform multilayer hBN by using a molten Fe82B18 alloy and N2 as reactants.Zhiyuan ShiXiujun WangQingtian LiPeng YangGuangyuan LuRen JiangHuishan WangChao ZhangChunxiao CongZhi LiuTianru WuHaomin WangQingkai YuXiaoming XieNature PortfolioarticleScienceQENNature Communications, Vol 11, Iss 1, Pp 1-8 (2020)
institution DOAJ
collection DOAJ
language EN
topic Science
Q
spellingShingle Science
Q
Zhiyuan Shi
Xiujun Wang
Qingtian Li
Peng Yang
Guangyuan Lu
Ren Jiang
Huishan Wang
Chao Zhang
Chunxiao Cong
Zhi Liu
Tianru Wu
Haomin Wang
Qingkai Yu
Xiaoming Xie
Vapor–liquid–solid growth of large-area multilayer hexagonal boron nitride on dielectric substrates
description Multilayer hexagonal boron nitride (hBN) is a desirable dielectric substrate for 2D electronics but its controllable synthesis is challenging. Here, the authors report a vapor–liquid–solid growth method to achieve uniform multilayer hBN by using a molten Fe82B18 alloy and N2 as reactants.
format article
author Zhiyuan Shi
Xiujun Wang
Qingtian Li
Peng Yang
Guangyuan Lu
Ren Jiang
Huishan Wang
Chao Zhang
Chunxiao Cong
Zhi Liu
Tianru Wu
Haomin Wang
Qingkai Yu
Xiaoming Xie
author_facet Zhiyuan Shi
Xiujun Wang
Qingtian Li
Peng Yang
Guangyuan Lu
Ren Jiang
Huishan Wang
Chao Zhang
Chunxiao Cong
Zhi Liu
Tianru Wu
Haomin Wang
Qingkai Yu
Xiaoming Xie
author_sort Zhiyuan Shi
title Vapor–liquid–solid growth of large-area multilayer hexagonal boron nitride on dielectric substrates
title_short Vapor–liquid–solid growth of large-area multilayer hexagonal boron nitride on dielectric substrates
title_full Vapor–liquid–solid growth of large-area multilayer hexagonal boron nitride on dielectric substrates
title_fullStr Vapor–liquid–solid growth of large-area multilayer hexagonal boron nitride on dielectric substrates
title_full_unstemmed Vapor–liquid–solid growth of large-area multilayer hexagonal boron nitride on dielectric substrates
title_sort vapor–liquid–solid growth of large-area multilayer hexagonal boron nitride on dielectric substrates
publisher Nature Portfolio
publishDate 2020
url https://doaj.org/article/8e4c858c9fc64e1589e0bca0ae54187e
work_keys_str_mv AT zhiyuanshi vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
AT xiujunwang vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
AT qingtianli vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
AT pengyang vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
AT guangyuanlu vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
AT renjiang vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
AT huishanwang vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
AT chaozhang vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
AT chunxiaocong vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
AT zhiliu vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
AT tianruwu vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
AT haominwang vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
AT qingkaiyu vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
AT xiaomingxie vaporliquidsolidgrowthoflargeareamultilayerhexagonalboronnitrideondielectricsubstrates
_version_ 1718383171662249984