Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns

The antireflection (AR) performance and far-field transmittance, depending on the morphology and parameters of subwavelength structures (SWSs), have been investigated by a 3-D finite-difference time-domain (FDTD) method. It is found that far-field transmission characteristics are dominated mainly by...

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Autores principales: Xin Ye, Jin Huang, Feng Geng, Laixi Sun, Hongjie Liu, Xiaodong Jiang, Weidong Wu, Xiaotao Zu, Wanguo Zheng
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Publicado: IEEE 2016
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spelling oai:doaj.org-article:9257cdca08014facbd65ec15acc0814e2021-11-24T00:00:08ZBroadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns1943-065510.1109/JPHOT.2015.2508723https://doaj.org/article/9257cdca08014facbd65ec15acc0814e2016-01-01T00:00:00Zhttps://ieeexplore.ieee.org/document/7355293/https://doaj.org/toc/1943-0655The antireflection (AR) performance and far-field transmittance, depending on the morphology and parameters of subwavelength structures (SWSs), have been investigated by a 3-D finite-difference time-domain (FDTD) method. It is found that far-field transmission characteristics are dominated mainly by period of SWSs. If the period is increased above 220 nm, the far-field transmittance rapidly decreases for a short-wavelength region. An effective and inexpensive method for fabricating disordered SWSs on fused silica has been demonstrated in this paper. An Au nanoscale island mask was formed by lower temperatures thermal dewetted at normal atmosphere. Then, a disordered SWS was fabricated by reactive ion etching (RIE). The average diameter of the Au nanoscale island was easily controlled by the thickness of Au thin films and annealing temperature. The etched depth and shape of fused silica SWSs depend additionally on RIE duration, thus achieving efficient AR characteristics. The measured data and calculated results obtained by the FDTD method exhibit reasonably similar tendencies. The optimized single-side fused silica SWS that is tapered on the tips leads to a significantly high transmissivity value of 96.2%. In addition, it exhibits a broadband AR property at a wavelength range of 400–1100 nm.Xin YeJin HuangFeng GengLaixi SunHongjie LiuXiaodong JiangWeidong WuXiaotao ZuWanguo ZhengIEEEarticleSubwavelength structureslow-temperature thermal dewettingeffective medium theoryfinite-difference time domainsoptical propertiesApplied optics. PhotonicsTA1501-1820Optics. LightQC350-467ENIEEE Photonics Journal, Vol 8, Iss 1, Pp 1-10 (2016)
institution DOAJ
collection DOAJ
language EN
topic Subwavelength structures
low-temperature thermal dewetting
effective medium theory
finite-difference time domains
optical properties
Applied optics. Photonics
TA1501-1820
Optics. Light
QC350-467
spellingShingle Subwavelength structures
low-temperature thermal dewetting
effective medium theory
finite-difference time domains
optical properties
Applied optics. Photonics
TA1501-1820
Optics. Light
QC350-467
Xin Ye
Jin Huang
Feng Geng
Laixi Sun
Hongjie Liu
Xiaodong Jiang
Weidong Wu
Xiaotao Zu
Wanguo Zheng
Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns
description The antireflection (AR) performance and far-field transmittance, depending on the morphology and parameters of subwavelength structures (SWSs), have been investigated by a 3-D finite-difference time-domain (FDTD) method. It is found that far-field transmission characteristics are dominated mainly by period of SWSs. If the period is increased above 220 nm, the far-field transmittance rapidly decreases for a short-wavelength region. An effective and inexpensive method for fabricating disordered SWSs on fused silica has been demonstrated in this paper. An Au nanoscale island mask was formed by lower temperatures thermal dewetted at normal atmosphere. Then, a disordered SWS was fabricated by reactive ion etching (RIE). The average diameter of the Au nanoscale island was easily controlled by the thickness of Au thin films and annealing temperature. The etched depth and shape of fused silica SWSs depend additionally on RIE duration, thus achieving efficient AR characteristics. The measured data and calculated results obtained by the FDTD method exhibit reasonably similar tendencies. The optimized single-side fused silica SWS that is tapered on the tips leads to a significantly high transmissivity value of 96.2%. In addition, it exhibits a broadband AR property at a wavelength range of 400–1100 nm.
format article
author Xin Ye
Jin Huang
Feng Geng
Laixi Sun
Hongjie Liu
Xiaodong Jiang
Weidong Wu
Xiaotao Zu
Wanguo Zheng
author_facet Xin Ye
Jin Huang
Feng Geng
Laixi Sun
Hongjie Liu
Xiaodong Jiang
Weidong Wu
Xiaotao Zu
Wanguo Zheng
author_sort Xin Ye
title Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns
title_short Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns
title_full Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns
title_fullStr Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns
title_full_unstemmed Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns
title_sort broadband antireflection subwavelength structures on fused silica using lower temperatures normal atmosphere thermal dewetted au nanopatterns
publisher IEEE
publishDate 2016
url https://doaj.org/article/9257cdca08014facbd65ec15acc0814e
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