Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns
The antireflection (AR) performance and far-field transmittance, depending on the morphology and parameters of subwavelength structures (SWSs), have been investigated by a 3-D finite-difference time-domain (FDTD) method. It is found that far-field transmission characteristics are dominated mainly by...
Guardado en:
Autores principales: | , , , , , , , , |
---|---|
Formato: | article |
Lenguaje: | EN |
Publicado: |
IEEE
2016
|
Materias: | |
Acceso en línea: | https://doaj.org/article/9257cdca08014facbd65ec15acc0814e |
Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
id |
oai:doaj.org-article:9257cdca08014facbd65ec15acc0814e |
---|---|
record_format |
dspace |
spelling |
oai:doaj.org-article:9257cdca08014facbd65ec15acc0814e2021-11-24T00:00:08ZBroadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns1943-065510.1109/JPHOT.2015.2508723https://doaj.org/article/9257cdca08014facbd65ec15acc0814e2016-01-01T00:00:00Zhttps://ieeexplore.ieee.org/document/7355293/https://doaj.org/toc/1943-0655The antireflection (AR) performance and far-field transmittance, depending on the morphology and parameters of subwavelength structures (SWSs), have been investigated by a 3-D finite-difference time-domain (FDTD) method. It is found that far-field transmission characteristics are dominated mainly by period of SWSs. If the period is increased above 220 nm, the far-field transmittance rapidly decreases for a short-wavelength region. An effective and inexpensive method for fabricating disordered SWSs on fused silica has been demonstrated in this paper. An Au nanoscale island mask was formed by lower temperatures thermal dewetted at normal atmosphere. Then, a disordered SWS was fabricated by reactive ion etching (RIE). The average diameter of the Au nanoscale island was easily controlled by the thickness of Au thin films and annealing temperature. The etched depth and shape of fused silica SWSs depend additionally on RIE duration, thus achieving efficient AR characteristics. The measured data and calculated results obtained by the FDTD method exhibit reasonably similar tendencies. The optimized single-side fused silica SWS that is tapered on the tips leads to a significantly high transmissivity value of 96.2%. In addition, it exhibits a broadband AR property at a wavelength range of 400–1100 nm.Xin YeJin HuangFeng GengLaixi SunHongjie LiuXiaodong JiangWeidong WuXiaotao ZuWanguo ZhengIEEEarticleSubwavelength structureslow-temperature thermal dewettingeffective medium theoryfinite-difference time domainsoptical propertiesApplied optics. PhotonicsTA1501-1820Optics. LightQC350-467ENIEEE Photonics Journal, Vol 8, Iss 1, Pp 1-10 (2016) |
institution |
DOAJ |
collection |
DOAJ |
language |
EN |
topic |
Subwavelength structures low-temperature thermal dewetting effective medium theory finite-difference time domains optical properties Applied optics. Photonics TA1501-1820 Optics. Light QC350-467 |
spellingShingle |
Subwavelength structures low-temperature thermal dewetting effective medium theory finite-difference time domains optical properties Applied optics. Photonics TA1501-1820 Optics. Light QC350-467 Xin Ye Jin Huang Feng Geng Laixi Sun Hongjie Liu Xiaodong Jiang Weidong Wu Xiaotao Zu Wanguo Zheng Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns |
description |
The antireflection (AR) performance and far-field transmittance, depending on the morphology and parameters of subwavelength structures (SWSs), have been investigated by a 3-D finite-difference time-domain (FDTD) method. It is found that far-field transmission characteristics are dominated mainly by period of SWSs. If the period is increased above 220 nm, the far-field transmittance rapidly decreases for a short-wavelength region. An effective and inexpensive method for fabricating disordered SWSs on fused silica has been demonstrated in this paper. An Au nanoscale island mask was formed by lower temperatures thermal dewetted at normal atmosphere. Then, a disordered SWS was fabricated by reactive ion etching (RIE). The average diameter of the Au nanoscale island was easily controlled by the thickness of Au thin films and annealing temperature. The etched depth and shape of fused silica SWSs depend additionally on RIE duration, thus achieving efficient AR characteristics. The measured data and calculated results obtained by the FDTD method exhibit reasonably similar tendencies. The optimized single-side fused silica SWS that is tapered on the tips leads to a significantly high transmissivity value of 96.2%. In addition, it exhibits a broadband AR property at a wavelength range of 400–1100 nm. |
format |
article |
author |
Xin Ye Jin Huang Feng Geng Laixi Sun Hongjie Liu Xiaodong Jiang Weidong Wu Xiaotao Zu Wanguo Zheng |
author_facet |
Xin Ye Jin Huang Feng Geng Laixi Sun Hongjie Liu Xiaodong Jiang Weidong Wu Xiaotao Zu Wanguo Zheng |
author_sort |
Xin Ye |
title |
Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns |
title_short |
Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns |
title_full |
Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns |
title_fullStr |
Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns |
title_full_unstemmed |
Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns |
title_sort |
broadband antireflection subwavelength structures on fused silica using lower temperatures normal atmosphere thermal dewetted au nanopatterns |
publisher |
IEEE |
publishDate |
2016 |
url |
https://doaj.org/article/9257cdca08014facbd65ec15acc0814e |
work_keys_str_mv |
AT xinye broadbandantireflectionsubwavelengthstructuresonfusedsilicausinglowertemperaturesnormalatmospherethermaldewettedaunanopatterns AT jinhuang broadbandantireflectionsubwavelengthstructuresonfusedsilicausinglowertemperaturesnormalatmospherethermaldewettedaunanopatterns AT fenggeng broadbandantireflectionsubwavelengthstructuresonfusedsilicausinglowertemperaturesnormalatmospherethermaldewettedaunanopatterns AT laixisun broadbandantireflectionsubwavelengthstructuresonfusedsilicausinglowertemperaturesnormalatmospherethermaldewettedaunanopatterns AT hongjieliu broadbandantireflectionsubwavelengthstructuresonfusedsilicausinglowertemperaturesnormalatmospherethermaldewettedaunanopatterns AT xiaodongjiang broadbandantireflectionsubwavelengthstructuresonfusedsilicausinglowertemperaturesnormalatmospherethermaldewettedaunanopatterns AT weidongwu broadbandantireflectionsubwavelengthstructuresonfusedsilicausinglowertemperaturesnormalatmospherethermaldewettedaunanopatterns AT xiaotaozu broadbandantireflectionsubwavelengthstructuresonfusedsilicausinglowertemperaturesnormalatmospherethermaldewettedaunanopatterns AT wanguozheng broadbandantireflectionsubwavelengthstructuresonfusedsilicausinglowertemperaturesnormalatmospherethermaldewettedaunanopatterns |
_version_ |
1718416109209649152 |