Study the electron field emission properties of plasma-based reduction of graphene oxide (GO): An ex-situ plasma approach

Vacuum-based electron emission devices requires fast and low turn-on field processes. Graphene oxide (GO) can be a perfect candidate for field electron emission applications. In this work, we have prepared graphene oxide (GO) via modified Hummer's method and treated it with dense plasma of argo...

Descripción completa

Guardado en:

Detalles Bibliográficos
Autores principales:	Mohammad Moeen Hasan Raza, Sunny Khan, Shah Masheerul Aalam, Mohd Sadiq, Mohd Sarvar, Mohammad Zulfequar, Samina Husain, Javid Ali
Formato:	article
Lenguaje:	EN
Publicado:	Elsevier 2021
Materias:	GO field emitters Ar plasma Field electron emission Current stability Orthodox test Chemistry QD1-999
Acceso en línea:	https://doaj.org/article/9275c7beb78c4dae9cef58346c80917d
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

id	oai:doaj.org-article:9275c7beb78c4dae9cef58346c80917d
record_format	dspace
spelling	oai:doaj.org-article:9275c7beb78c4dae9cef58346c80917d2021-11-18T04:53:47ZStudy the electron field emission properties of plasma-based reduction of graphene oxide (GO): An ex-situ plasma approach2667-056910.1016/j.cartre.2021.100127https://doaj.org/article/9275c7beb78c4dae9cef58346c80917d2021-10-01T00:00:00Zhttp://www.sciencedirect.com/science/article/pii/S2667056921001048https://doaj.org/toc/2667-0569Vacuum-based electron emission devices requires fast and low turn-on field processes. Graphene oxide (GO) can be a perfect candidate for field electron emission applications. In this work, we have prepared graphene oxide (GO) via modified Hummer's method and treated it with dense plasma of argon gas (Ar). The surface morphology of the prepared GO reveals the growth of the stacked-layer and large surface area flakes of GO. Raman spectra reveals the high defective growth of GO. The impurities in the GO are due to the incorporation of oxygen moieties. For enhancing the field emission properties, the GO thin films were treated with a dense plasma of Ar gas at 50, 100, 150 and 200 W. Raman spectra strongly indicates the removal of oxygen moieties and formation of defects and vacancies in the sheet of plasma-treated GO. The field emission properties drastically improved in the scenario of plasma-treated GO field emitters. The turn-on and threshold fields were reduced after plasma treatment in comparison with pristine GO field emitters. The reduction in the turn-on and threshold fields is due to the enhancement in the edge effects, protrusion formation and modification in structural properties. The emission current density was drastically enhanced in the 200 W plasma-treated GO field emitters. The emission stability test was performed for a 600 min at 3V/μm applied electric field. The stability was enhanced with plasma power and shows the minimum current fluctuation. The field enhancement factor also improved after plasma treatment and for 200 W treated β becomes 3 times the pristine GO. We have also implemented the orthodox emission hypothesis test, which was qualified by the prepared pristine and plasma-treated GO field emitters due to the fextr values belonging in the acceptable range. Conclusively, Ar gas plasma-treated GO field emitters can be useful for emission applications in vacuum devices.Mohammad Moeen Hasan RazaSunny KhanShah Masheerul AalamMohd SadiqMohd SarvarMohammad ZulfequarSamina HusainJavid AliElsevierarticleGO field emittersAr plasmaField electron emissionCurrent stabilityOrthodox testChemistryQD1-999ENCarbon Trends, Vol 5, Iss , Pp 100127- (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	GO field emitters Ar plasma Field electron emission Current stability Orthodox test Chemistry QD1-999
spellingShingle	GO field emitters Ar plasma Field electron emission Current stability Orthodox test Chemistry QD1-999 Mohammad Moeen Hasan Raza Sunny Khan Shah Masheerul Aalam Mohd Sadiq Mohd Sarvar Mohammad Zulfequar Samina Husain Javid Ali Study the electron field emission properties of plasma-based reduction of graphene oxide (GO): An ex-situ plasma approach
description	Vacuum-based electron emission devices requires fast and low turn-on field processes. Graphene oxide (GO) can be a perfect candidate for field electron emission applications. In this work, we have prepared graphene oxide (GO) via modified Hummer's method and treated it with dense plasma of argon gas (Ar). The surface morphology of the prepared GO reveals the growth of the stacked-layer and large surface area flakes of GO. Raman spectra reveals the high defective growth of GO. The impurities in the GO are due to the incorporation of oxygen moieties. For enhancing the field emission properties, the GO thin films were treated with a dense plasma of Ar gas at 50, 100, 150 and 200 W. Raman spectra strongly indicates the removal of oxygen moieties and formation of defects and vacancies in the sheet of plasma-treated GO. The field emission properties drastically improved in the scenario of plasma-treated GO field emitters. The turn-on and threshold fields were reduced after plasma treatment in comparison with pristine GO field emitters. The reduction in the turn-on and threshold fields is due to the enhancement in the edge effects, protrusion formation and modification in structural properties. The emission current density was drastically enhanced in the 200 W plasma-treated GO field emitters. The emission stability test was performed for a 600 min at 3V/μm applied electric field. The stability was enhanced with plasma power and shows the minimum current fluctuation. The field enhancement factor also improved after plasma treatment and for 200 W treated β becomes 3 times the pristine GO. We have also implemented the orthodox emission hypothesis test, which was qualified by the prepared pristine and plasma-treated GO field emitters due to the fextr values belonging in the acceptable range. Conclusively, Ar gas plasma-treated GO field emitters can be useful for emission applications in vacuum devices.
format	article
author	Mohammad Moeen Hasan Raza Sunny Khan Shah Masheerul Aalam Mohd Sadiq Mohd Sarvar Mohammad Zulfequar Samina Husain Javid Ali
author_facet	Mohammad Moeen Hasan Raza Sunny Khan Shah Masheerul Aalam Mohd Sadiq Mohd Sarvar Mohammad Zulfequar Samina Husain Javid Ali
author_sort	Mohammad Moeen Hasan Raza
title	Study the electron field emission properties of plasma-based reduction of graphene oxide (GO): An ex-situ plasma approach
title_short	Study the electron field emission properties of plasma-based reduction of graphene oxide (GO): An ex-situ plasma approach
title_full	Study the electron field emission properties of plasma-based reduction of graphene oxide (GO): An ex-situ plasma approach
title_fullStr	Study the electron field emission properties of plasma-based reduction of graphene oxide (GO): An ex-situ plasma approach
title_full_unstemmed	Study the electron field emission properties of plasma-based reduction of graphene oxide (GO): An ex-situ plasma approach
title_sort	study the electron field emission properties of plasma-based reduction of graphene oxide (go): an ex-situ plasma approach
publisher	Elsevier
publishDate	2021
url	https://doaj.org/article/9275c7beb78c4dae9cef58346c80917d
work_keys_str_mv	AT mohammadmoeenhasanraza studytheelectronfieldemissionpropertiesofplasmabasedreductionofgrapheneoxidegoanexsituplasmaapproach AT sunnykhan studytheelectronfieldemissionpropertiesofplasmabasedreductionofgrapheneoxidegoanexsituplasmaapproach AT shahmasheerulaalam studytheelectronfieldemissionpropertiesofplasmabasedreductionofgrapheneoxidegoanexsituplasmaapproach AT mohdsadiq studytheelectronfieldemissionpropertiesofplasmabasedreductionofgrapheneoxidegoanexsituplasmaapproach AT mohdsarvar studytheelectronfieldemissionpropertiesofplasmabasedreductionofgrapheneoxidegoanexsituplasmaapproach AT mohammadzulfequar studytheelectronfieldemissionpropertiesofplasmabasedreductionofgrapheneoxidegoanexsituplasmaapproach AT saminahusain studytheelectronfieldemissionpropertiesofplasmabasedreductionofgrapheneoxidegoanexsituplasmaapproach AT javidali studytheelectronfieldemissionpropertiesofplasmabasedreductionofgrapheneoxidegoanexsituplasmaapproach
_version_	1718424927282921472

Study the electron field emission properties of plasma-based reduction of graphene oxide (GO): An ex-situ plasma approach

Ejemplares similares