Heterogeneous integration of single-crystalline rutile nanomembranes with steep phase transition on silicon substrates

Unrestricted integration of single-crystal oxide films on Si substrates allows for exploitation of emerging functionality of new materials in mature silicon devices. Here the authors integrate epitaxial oxide films with sharp metal-insulator transition on Si substrates by epitaxial lift-off of a fre...

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Autores principales:	Dong Kyu Lee, Yunkyu Park, Hyeji Sim, Jinheon Park, Younghak Kim, Gi-Yeop Kim, Chang-Beom Eom, Si-Young Choi, Junwoo Son
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2021
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/92905b9bc6d94e84987d903f42efdbfb
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spelling	oai:doaj.org-article:92905b9bc6d94e84987d903f42efdbfb2021-12-02T18:01:17ZHeterogeneous integration of single-crystalline rutile nanomembranes with steep phase transition on silicon substrates10.1038/s41467-021-24740-22041-1723https://doaj.org/article/92905b9bc6d94e84987d903f42efdbfb2021-08-01T00:00:00Zhttps://doi.org/10.1038/s41467-021-24740-2https://doaj.org/toc/2041-1723Unrestricted integration of single-crystal oxide films on Si substrates allows for exploitation of emerging functionality of new materials in mature silicon devices. Here the authors integrate epitaxial oxide films with sharp metal-insulator transition on Si substrates by epitaxial lift-off of a freestanding nanomembrane.Dong Kyu LeeYunkyu ParkHyeji SimJinheon ParkYounghak KimGi-Yeop KimChang-Beom EomSi-Young ChoiJunwoo SonNature PortfolioarticleScienceQENNature Communications, Vol 12, Iss 1, Pp 1-8 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q Dong Kyu Lee Yunkyu Park Hyeji Sim Jinheon Park Younghak Kim Gi-Yeop Kim Chang-Beom Eom Si-Young Choi Junwoo Son Heterogeneous integration of single-crystalline rutile nanomembranes with steep phase transition on silicon substrates
description	Unrestricted integration of single-crystal oxide films on Si substrates allows for exploitation of emerging functionality of new materials in mature silicon devices. Here the authors integrate epitaxial oxide films with sharp metal-insulator transition on Si substrates by epitaxial lift-off of a freestanding nanomembrane.
format	article
author	Dong Kyu Lee Yunkyu Park Hyeji Sim Jinheon Park Younghak Kim Gi-Yeop Kim Chang-Beom Eom Si-Young Choi Junwoo Son
author_facet	Dong Kyu Lee Yunkyu Park Hyeji Sim Jinheon Park Younghak Kim Gi-Yeop Kim Chang-Beom Eom Si-Young Choi Junwoo Son
author_sort	Dong Kyu Lee
title	Heterogeneous integration of single-crystalline rutile nanomembranes with steep phase transition on silicon substrates
title_short	Heterogeneous integration of single-crystalline rutile nanomembranes with steep phase transition on silicon substrates
title_full	Heterogeneous integration of single-crystalline rutile nanomembranes with steep phase transition on silicon substrates
title_fullStr	Heterogeneous integration of single-crystalline rutile nanomembranes with steep phase transition on silicon substrates
title_full_unstemmed	Heterogeneous integration of single-crystalline rutile nanomembranes with steep phase transition on silicon substrates
title_sort	heterogeneous integration of single-crystalline rutile nanomembranes with steep phase transition on silicon substrates
publisher	Nature Portfolio
publishDate	2021
url	https://doaj.org/article/92905b9bc6d94e84987d903f42efdbfb
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Heterogeneous integration of single-crystalline rutile nanomembranes with steep phase transition on silicon substrates

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