Heterogeneous integration of single-crystalline rutile nanomembranes with steep phase transition on silicon substrates
Unrestricted integration of single-crystal oxide films on Si substrates allows for exploitation of emerging functionality of new materials in mature silicon devices. Here the authors integrate epitaxial oxide films with sharp metal-insulator transition on Si substrates by epitaxial lift-off of a fre...
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Autores principales: | Dong Kyu Lee, Yunkyu Park, Hyeji Sim, Jinheon Park, Younghak Kim, Gi-Yeop Kim, Chang-Beom Eom, Si-Young Choi, Junwoo Son |
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Formato: | article |
Lenguaje: | EN |
Publicado: |
Nature Portfolio
2021
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Materias: | |
Acceso en línea: | https://doaj.org/article/92905b9bc6d94e84987d903f42efdbfb |
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