Surface Topography of PVD Hard Coatings

The primary objective of this study was to investigate and compare the surface topography of hard coatings deposited by three different physical vapor deposition methods (PVD): low-voltage electron beam evaporation, unbalanced magnetron sputtering and cathodic arc evaporation. In these deposition sy...

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Autores principales: Peter Panjan, Aljaž Drnovšek, Nastja Mahne, Miha Čekada, Matjaž Panjan
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Lenguaje:EN
Publicado: MDPI AG 2021
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Acceso en línea:https://doaj.org/article/9904223d7b4a42ab8c28d9abafff3c85
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spelling oai:doaj.org-article:9904223d7b4a42ab8c28d9abafff3c852021-11-25T17:16:44ZSurface Topography of PVD Hard Coatings10.3390/coatings111113872079-6412https://doaj.org/article/9904223d7b4a42ab8c28d9abafff3c852021-11-01T00:00:00Zhttps://www.mdpi.com/2079-6412/11/11/1387https://doaj.org/toc/2079-6412The primary objective of this study was to investigate and compare the surface topography of hard coatings deposited by three different physical vapor deposition methods (PVD): low-voltage electron beam evaporation, unbalanced magnetron sputtering and cathodic arc evaporation. In these deposition systems, various ion etching techniques were applied for substrate cleaning. The paper summarizes our experience and the expertise gained during many years of development of PVD hard coatings for the protection of tools and machine components. Surface topography was investigated using scanning electron microscopy (SEM), atomic force microscopy (AFM), scanning transmission electron microscopy (STEM) and 3D stylus profilometry. Observed similarities and differences among samples deposited by various deposition methods are discussed and correlated with substrate material selection, substrate pretreatment and deposition conditions. Large variations in the surface topography were observed between selected deposition techniques, both after ion etching and deposition processes. The main features and implications of surface cleaning by ion etching are discussed and the physical phenomena involved in this process are reviewed. During a given deposition run as well as from one run to another, a large spatial variation of etching rates was observed due to the difference in substrate geometry and batching configurations. Variations related to the specific substrate rotation (i.e., temporal variations in the etching and deposition) were also observed. The etching efficiency can be explained by the influence of different process parameters, such as substrate-to-source orientation and distance, shadowing and electric field effects. The surface roughness of PVD coatings mainly originates from growth defects (droplets, nodular defects, pinholes, craters, etc.). We briefly describe the causes of their formation.Peter PanjanAljaž DrnovšekNastja MahneMiha ČekadaMatjaž PanjanMDPI AGarticletopographyPVD coatingion etchingsputtering3D stylus profilometryatomic force microscopyEngineering (General). Civil engineering (General)TA1-2040ENCoatings, Vol 11, Iss 1387, p 1387 (2021)
institution DOAJ
collection DOAJ
language EN
topic topography
PVD coating
ion etching
sputtering
3D stylus profilometry
atomic force microscopy
Engineering (General). Civil engineering (General)
TA1-2040
spellingShingle topography
PVD coating
ion etching
sputtering
3D stylus profilometry
atomic force microscopy
Engineering (General). Civil engineering (General)
TA1-2040
Peter Panjan
Aljaž Drnovšek
Nastja Mahne
Miha Čekada
Matjaž Panjan
Surface Topography of PVD Hard Coatings
description The primary objective of this study was to investigate and compare the surface topography of hard coatings deposited by three different physical vapor deposition methods (PVD): low-voltage electron beam evaporation, unbalanced magnetron sputtering and cathodic arc evaporation. In these deposition systems, various ion etching techniques were applied for substrate cleaning. The paper summarizes our experience and the expertise gained during many years of development of PVD hard coatings for the protection of tools and machine components. Surface topography was investigated using scanning electron microscopy (SEM), atomic force microscopy (AFM), scanning transmission electron microscopy (STEM) and 3D stylus profilometry. Observed similarities and differences among samples deposited by various deposition methods are discussed and correlated with substrate material selection, substrate pretreatment and deposition conditions. Large variations in the surface topography were observed between selected deposition techniques, both after ion etching and deposition processes. The main features and implications of surface cleaning by ion etching are discussed and the physical phenomena involved in this process are reviewed. During a given deposition run as well as from one run to another, a large spatial variation of etching rates was observed due to the difference in substrate geometry and batching configurations. Variations related to the specific substrate rotation (i.e., temporal variations in the etching and deposition) were also observed. The etching efficiency can be explained by the influence of different process parameters, such as substrate-to-source orientation and distance, shadowing and electric field effects. The surface roughness of PVD coatings mainly originates from growth defects (droplets, nodular defects, pinholes, craters, etc.). We briefly describe the causes of their formation.
format article
author Peter Panjan
Aljaž Drnovšek
Nastja Mahne
Miha Čekada
Matjaž Panjan
author_facet Peter Panjan
Aljaž Drnovšek
Nastja Mahne
Miha Čekada
Matjaž Panjan
author_sort Peter Panjan
title Surface Topography of PVD Hard Coatings
title_short Surface Topography of PVD Hard Coatings
title_full Surface Topography of PVD Hard Coatings
title_fullStr Surface Topography of PVD Hard Coatings
title_full_unstemmed Surface Topography of PVD Hard Coatings
title_sort surface topography of pvd hard coatings
publisher MDPI AG
publishDate 2021
url https://doaj.org/article/9904223d7b4a42ab8c28d9abafff3c85
work_keys_str_mv AT peterpanjan surfacetopographyofpvdhardcoatings
AT aljazdrnovsek surfacetopographyofpvdhardcoatings
AT nastjamahne surfacetopographyofpvdhardcoatings
AT mihacekada surfacetopographyofpvdhardcoatings
AT matjazpanjan surfacetopographyofpvdhardcoatings
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