An advanced III-V-on-silicon photonic integration platform

In many application scenarios, silicon (Si) photonics favors the integration of III-V gain material onto Si substrate to realize the on-chip light source. In addition to the current popular integration approaches of III-V-on-Si wafer bonding or direct heteroepitaxial growth, a newly emerged promisin...

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Autores principales: Yingtao Hu, Di Liang, Raymond G. Beausoleil
Formato: article
Lenguaje:EN
Publicado: Institue of Optics and Electronics, Chinese Academy of Sciences 2021
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Acceso en línea:https://doaj.org/article/9b955c7e81a74ddd924c0827f4c89960
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spelling oai:doaj.org-article:9b955c7e81a74ddd924c0827f4c899602021-11-17T07:53:29ZAn advanced III-V-on-silicon photonic integration platform2096-457910.29026/oea.2021.200094https://doaj.org/article/9b955c7e81a74ddd924c0827f4c899602021-09-01T00:00:00Zhttp://www.oejournal.org/article/doi/10.29026/oea.2021.200094https://doaj.org/toc/2096-4579In many application scenarios, silicon (Si) photonics favors the integration of III-V gain material onto Si substrate to realize the on-chip light source. In addition to the current popular integration approaches of III-V-on-Si wafer bonding or direct heteroepitaxial growth, a newly emerged promising solution of epitaxial regrowth on bonded substrate has attracted a lot of interests. High-quality III-V material realization and successful laser demonstrations show its great potential to be a promising integration platform for low-cost, high-integration density and highly scalable active-passive photonic integration on Si. This paper reviews recent research work on this regrowth on bonded template platform including template developments, regrown material characterizations and laser demonstrations. The potential advantages, opportunities and challenges of this approach are discussed.Yingtao HuDi LiangRaymond G. BeausoleilInstitue of Optics and Electronics, Chinese Academy of Sciencesarticlesi photonicsiii-v-on-si laserphotonic integrationepitaxy regrowthOptics. LightQC350-467ENOpto-Electronic Advances, Vol 4, Iss 9, Pp 1-14 (2021)
institution DOAJ
collection DOAJ
language EN
topic si photonics
iii-v-on-si laser
photonic integration
epitaxy regrowth
Optics. Light
QC350-467
spellingShingle si photonics
iii-v-on-si laser
photonic integration
epitaxy regrowth
Optics. Light
QC350-467
Yingtao Hu
Di Liang
Raymond G. Beausoleil
An advanced III-V-on-silicon photonic integration platform
description In many application scenarios, silicon (Si) photonics favors the integration of III-V gain material onto Si substrate to realize the on-chip light source. In addition to the current popular integration approaches of III-V-on-Si wafer bonding or direct heteroepitaxial growth, a newly emerged promising solution of epitaxial regrowth on bonded substrate has attracted a lot of interests. High-quality III-V material realization and successful laser demonstrations show its great potential to be a promising integration platform for low-cost, high-integration density and highly scalable active-passive photonic integration on Si. This paper reviews recent research work on this regrowth on bonded template platform including template developments, regrown material characterizations and laser demonstrations. The potential advantages, opportunities and challenges of this approach are discussed.
format article
author Yingtao Hu
Di Liang
Raymond G. Beausoleil
author_facet Yingtao Hu
Di Liang
Raymond G. Beausoleil
author_sort Yingtao Hu
title An advanced III-V-on-silicon photonic integration platform
title_short An advanced III-V-on-silicon photonic integration platform
title_full An advanced III-V-on-silicon photonic integration platform
title_fullStr An advanced III-V-on-silicon photonic integration platform
title_full_unstemmed An advanced III-V-on-silicon photonic integration platform
title_sort advanced iii-v-on-silicon photonic integration platform
publisher Institue of Optics and Electronics, Chinese Academy of Sciences
publishDate 2021
url https://doaj.org/article/9b955c7e81a74ddd924c0827f4c89960
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