Physical origins of current and temperature controlled negative differential resistances in NbO2

The development of future computation devices will be aided by a better understanding of the physics underlying material behaviors. Using thermoreflectance and spatially resolved X-ray microscopy, Kumar et al. elucidate the origin of two types of negative differential resistance in NbO2 memristors.

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Autores principales: Suhas Kumar, Ziwen Wang, Noraica Davila, Niru Kumari, Kate J. Norris, Xiaopeng Huang, John Paul Strachan, David Vine, A.L. David Kilcoyne, Yoshio Nishi, R. Stanley Williams
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Lenguaje:EN
Publicado: Nature Portfolio 2017
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Acceso en línea:https://doaj.org/article/9cacbc93e15e4d6faea02286889b8cf5
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spelling oai:doaj.org-article:9cacbc93e15e4d6faea02286889b8cf52021-12-02T14:42:27ZPhysical origins of current and temperature controlled negative differential resistances in NbO210.1038/s41467-017-00773-42041-1723https://doaj.org/article/9cacbc93e15e4d6faea02286889b8cf52017-09-01T00:00:00Zhttps://doi.org/10.1038/s41467-017-00773-4https://doaj.org/toc/2041-1723The development of future computation devices will be aided by a better understanding of the physics underlying material behaviors. Using thermoreflectance and spatially resolved X-ray microscopy, Kumar et al. elucidate the origin of two types of negative differential resistance in NbO2 memristors.Suhas KumarZiwen WangNoraica DavilaNiru KumariKate J. NorrisXiaopeng HuangJohn Paul StrachanDavid VineA.L. David KilcoyneYoshio NishiR. Stanley WilliamsNature PortfolioarticleScienceQENNature Communications, Vol 8, Iss 1, Pp 1-6 (2017)
institution DOAJ
collection DOAJ
language EN
topic Science
Q
spellingShingle Science
Q
Suhas Kumar
Ziwen Wang
Noraica Davila
Niru Kumari
Kate J. Norris
Xiaopeng Huang
John Paul Strachan
David Vine
A.L. David Kilcoyne
Yoshio Nishi
R. Stanley Williams
Physical origins of current and temperature controlled negative differential resistances in NbO2
description The development of future computation devices will be aided by a better understanding of the physics underlying material behaviors. Using thermoreflectance and spatially resolved X-ray microscopy, Kumar et al. elucidate the origin of two types of negative differential resistance in NbO2 memristors.
format article
author Suhas Kumar
Ziwen Wang
Noraica Davila
Niru Kumari
Kate J. Norris
Xiaopeng Huang
John Paul Strachan
David Vine
A.L. David Kilcoyne
Yoshio Nishi
R. Stanley Williams
author_facet Suhas Kumar
Ziwen Wang
Noraica Davila
Niru Kumari
Kate J. Norris
Xiaopeng Huang
John Paul Strachan
David Vine
A.L. David Kilcoyne
Yoshio Nishi
R. Stanley Williams
author_sort Suhas Kumar
title Physical origins of current and temperature controlled negative differential resistances in NbO2
title_short Physical origins of current and temperature controlled negative differential resistances in NbO2
title_full Physical origins of current and temperature controlled negative differential resistances in NbO2
title_fullStr Physical origins of current and temperature controlled negative differential resistances in NbO2
title_full_unstemmed Physical origins of current and temperature controlled negative differential resistances in NbO2
title_sort physical origins of current and temperature controlled negative differential resistances in nbo2
publisher Nature Portfolio
publishDate 2017
url https://doaj.org/article/9cacbc93e15e4d6faea02286889b8cf5
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