Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography

In this study, Atomic Force Microscopy-based nanoindentation (AFM-NI) with diamond-like carbon (DLC) coated tip was used to analyze the mechanical response of poly(methyl methacrylate) (PMMA) thin films (thicknesses: 235 and 513 nm) on a silicon substrate. Then, Oliver and Pharr (OP) model was used...

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Autores principales:	Hubert Grzywacz, Piotr Jenczyk, Michał Milczarek, Marcin Michałowski, Dariusz M. Jarząbek
Formato:	article
Lenguaje:	EN
Publicado:	MDPI AG 2021
Materias:	PMMA atomic force microscopy-based nanoindentation Young’s modulus hardness viscosity Burger creep model Technology T Electrical engineering. Electronics. Nuclear engineering TK1-9971 Engineering (General). Civil engineering (General) TA1-2040 Microscopy QH201-278.5 Descriptive and experimental mechanics QC120-168.85
Acceso en línea:	https://doaj.org/article/9e5351e8473d478fa7f6326278f1c09b
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spelling	oai:doaj.org-article:9e5351e8473d478fa7f6326278f1c09b2021-11-11T18:09:53ZBurger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography10.3390/ma142166391996-1944https://doaj.org/article/9e5351e8473d478fa7f6326278f1c09b2021-11-01T00:00:00Zhttps://www.mdpi.com/1996-1944/14/21/6639https://doaj.org/toc/1996-1944In this study, Atomic Force Microscopy-based nanoindentation (AFM-NI) with diamond-like carbon (DLC) coated tip was used to analyze the mechanical response of poly(methyl methacrylate) (PMMA) thin films (thicknesses: 235 and 513 nm) on a silicon substrate. Then, Oliver and Pharr (OP) model was used to calculate hardness and Young’s modulus, while three different Static Linear Solid models were used to fit the creep curve and measure creep compliance, Young’s modulus, and viscosity. Values were compared with each other, and the best-suited method was suggested. The impact of four temperatures below the glass transition temperature and varied indentation depth on the mechanical properties has been analyzed. The results show high sensitivity on experiment parameters and there is a clear difference between thin and thick film. According to the requirements in the nanoimprint lithography (NIL), the ratio of hardness at demolding temperature to viscosity at molding temperature was introduced as a simple parameter for prediction of resist suitability for NIL. Finally, thinner PMMA film was tentatively attributed as more suitable for NIL.Hubert GrzywaczPiotr JenczykMichał MilczarekMarcin MichałowskiDariusz M. JarząbekMDPI AGarticlePMMAatomic force microscopy-based nanoindentationYoung’s modulushardnessviscosityBurger creep modelTechnologyTElectrical engineering. Electronics. Nuclear engineeringTK1-9971Engineering (General). Civil engineering (General)TA1-2040MicroscopyQH201-278.5Descriptive and experimental mechanicsQC120-168.85ENMaterials, Vol 14, Iss 6639, p 6639 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	PMMA atomic force microscopy-based nanoindentation Young’s modulus hardness viscosity Burger creep model Technology T Electrical engineering. Electronics. Nuclear engineering TK1-9971 Engineering (General). Civil engineering (General) TA1-2040 Microscopy QH201-278.5 Descriptive and experimental mechanics QC120-168.85
spellingShingle	PMMA atomic force microscopy-based nanoindentation Young’s modulus hardness viscosity Burger creep model Technology T Electrical engineering. Electronics. Nuclear engineering TK1-9971 Engineering (General). Civil engineering (General) TA1-2040 Microscopy QH201-278.5 Descriptive and experimental mechanics QC120-168.85 Hubert Grzywacz Piotr Jenczyk Michał Milczarek Marcin Michałowski Dariusz M. Jarząbek Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography
description	In this study, Atomic Force Microscopy-based nanoindentation (AFM-NI) with diamond-like carbon (DLC) coated tip was used to analyze the mechanical response of poly(methyl methacrylate) (PMMA) thin films (thicknesses: 235 and 513 nm) on a silicon substrate. Then, Oliver and Pharr (OP) model was used to calculate hardness and Young’s modulus, while three different Static Linear Solid models were used to fit the creep curve and measure creep compliance, Young’s modulus, and viscosity. Values were compared with each other, and the best-suited method was suggested. The impact of four temperatures below the glass transition temperature and varied indentation depth on the mechanical properties has been analyzed. The results show high sensitivity on experiment parameters and there is a clear difference between thin and thick film. According to the requirements in the nanoimprint lithography (NIL), the ratio of hardness at demolding temperature to viscosity at molding temperature was introduced as a simple parameter for prediction of resist suitability for NIL. Finally, thinner PMMA film was tentatively attributed as more suitable for NIL.
format	article
author	Hubert Grzywacz Piotr Jenczyk Michał Milczarek Marcin Michałowski Dariusz M. Jarząbek
author_facet	Hubert Grzywacz Piotr Jenczyk Michał Milczarek Marcin Michałowski Dariusz M. Jarząbek
author_sort	Hubert Grzywacz
title	Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography
title_short	Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography
title_full	Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography
title_fullStr	Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography
title_full_unstemmed	Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography
title_sort	burger model as the best option for modeling of viscoelastic behavior of resists for nanoimprint lithography
publisher	MDPI AG
publishDate	2021
url	https://doaj.org/article/9e5351e8473d478fa7f6326278f1c09b
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Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography

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