Ultra-broadband, lithography-free, omnidirectional, and polarization-insensitive perfect absorber

Abstract Perfect absorbers (PAs) at near infrared allow various applications such as biosensors, nonlinear optics, color filters, thermal emitters and so on. These PAs, enabled by plasmonic resonance, are typically powerful and compact, but confront inherent challenges of narrow bandwidth, polarizat...

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Autores principales:	Tse-An Chen, Meng-Ju Yub, Yu-Jung Lu, Ta-Jen Yen
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2021
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/a3077ce2132d4802b49d408456dbc35b
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spelling	oai:doaj.org-article:a3077ce2132d4802b49d408456dbc35b2021-12-02T13:20:13ZUltra-broadband, lithography-free, omnidirectional, and polarization-insensitive perfect absorber10.1038/s41598-021-84889-02045-2322https://doaj.org/article/a3077ce2132d4802b49d408456dbc35b2021-03-01T00:00:00Zhttps://doi.org/10.1038/s41598-021-84889-0https://doaj.org/toc/2045-2322Abstract Perfect absorbers (PAs) at near infrared allow various applications such as biosensors, nonlinear optics, color filters, thermal emitters and so on. These PAs, enabled by plasmonic resonance, are typically powerful and compact, but confront inherent challenges of narrow bandwidth, polarization dependence, and limited incident angles as well as requires using expensive lithographic process, which limit their practical applications and mass production. In this work, we demonstrate a non-resonant PA that is comprised of six continuous layers of magnesium fluoride (MgF2) and chromium (Cr) in turns. Our device absorbs more than 90% of light in a broad range of 900–1900 nm. In addition, such a planar design is lithography-free, certainly independent with polarization, and presents a further advantage of wide incidence up to 70°. The measured performance of our optimized PA agrees well with analytical calculations of transfer matrix method (TMM) and numerical simulations of finite element method, and can be readily implemented for practical applications.Tse-An ChenMeng-Ju YubYu-Jung LuTa-Jen YenNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 11, Iss 1, Pp 1-7 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Medicine R Science Q
spellingShingle	Medicine R Science Q Tse-An Chen Meng-Ju Yub Yu-Jung Lu Ta-Jen Yen Ultra-broadband, lithography-free, omnidirectional, and polarization-insensitive perfect absorber
description	Abstract Perfect absorbers (PAs) at near infrared allow various applications such as biosensors, nonlinear optics, color filters, thermal emitters and so on. These PAs, enabled by plasmonic resonance, are typically powerful and compact, but confront inherent challenges of narrow bandwidth, polarization dependence, and limited incident angles as well as requires using expensive lithographic process, which limit their practical applications and mass production. In this work, we demonstrate a non-resonant PA that is comprised of six continuous layers of magnesium fluoride (MgF2) and chromium (Cr) in turns. Our device absorbs more than 90% of light in a broad range of 900–1900 nm. In addition, such a planar design is lithography-free, certainly independent with polarization, and presents a further advantage of wide incidence up to 70°. The measured performance of our optimized PA agrees well with analytical calculations of transfer matrix method (TMM) and numerical simulations of finite element method, and can be readily implemented for practical applications.
format	article
author	Tse-An Chen Meng-Ju Yub Yu-Jung Lu Ta-Jen Yen
author_facet	Tse-An Chen Meng-Ju Yub Yu-Jung Lu Ta-Jen Yen
author_sort	Tse-An Chen
title	Ultra-broadband, lithography-free, omnidirectional, and polarization-insensitive perfect absorber
title_short	Ultra-broadband, lithography-free, omnidirectional, and polarization-insensitive perfect absorber
title_full	Ultra-broadband, lithography-free, omnidirectional, and polarization-insensitive perfect absorber
title_fullStr	Ultra-broadband, lithography-free, omnidirectional, and polarization-insensitive perfect absorber
title_full_unstemmed	Ultra-broadband, lithography-free, omnidirectional, and polarization-insensitive perfect absorber
title_sort	ultra-broadband, lithography-free, omnidirectional, and polarization-insensitive perfect absorber
publisher	Nature Portfolio
publishDate	2021
url	https://doaj.org/article/a3077ce2132d4802b49d408456dbc35b
work_keys_str_mv	AT tseanchen ultrabroadbandlithographyfreeomnidirectionalandpolarizationinsensitiveperfectabsorber AT mengjuyub ultrabroadbandlithographyfreeomnidirectionalandpolarizationinsensitiveperfectabsorber AT yujunglu ultrabroadbandlithographyfreeomnidirectionalandpolarizationinsensitiveperfectabsorber AT tajenyen ultrabroadbandlithographyfreeomnidirectionalandpolarizationinsensitiveperfectabsorber
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Ultra-broadband, lithography-free, omnidirectional, and polarization-insensitive perfect absorber

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