Extraction of Preisach model parameters for fluorite-structure ferroelectrics and antiferroelectrics

Abstract Flourite-structure ferroelectrics (FEs) and antiferroelectrics (AFEs) such as HfO2 and its variants have gained copious attention from the semiconductor community, because they enable complementary metal-oxide-semiconductor (CMOS)-compatible platforms for high-density, high-performance non-...

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Bibliographic Details
Main Authors: Zheng Wang, Jae Hur, Nujhat Tasneem, Winston Chern, Shimeng Yu, Asif Khan
Format: article
Language:EN
Published: Nature Portfolio 2021
Subjects:
R
Q
Online Access:https://doaj.org/article/a54ea8f3c3e94176a2b9cbf6d98f838f
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