Passive Control of Silane Diffusion for Gradient Application of Surface Properties

Liquid lithography represents a robust technique for fabricating three-dimensional (3D) microstructures on a two-dimensional template. Silanization of a surface is often a key step in the liquid lithography process and is used to alter the surface energy of the substrate and, consequently, the shape...

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Autores principales:	Riley L. Howard, Francesca Bernardi, Matthew Leff, Emma Abele, Nancy L. Allbritton, Daniel M. Harris
Formato:	article
Lenguaje:	EN
Publicado:	MDPI AG 2021
Materias:	liquid lithography silanization Monte Carlo gradient wettability micropillar Mechanical engineering and machinery TJ1-1570
Acceso en línea:	https://doaj.org/article/a715802d20d84dc68a5b2302a0410aaf
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spelling	oai:doaj.org-article:a715802d20d84dc68a5b2302a0410aaf2021-11-25T18:23:23ZPassive Control of Silane Diffusion for Gradient Application of Surface Properties10.3390/mi121113602072-666Xhttps://doaj.org/article/a715802d20d84dc68a5b2302a0410aaf2021-11-01T00:00:00Zhttps://www.mdpi.com/2072-666X/12/11/1360https://doaj.org/toc/2072-666XLiquid lithography represents a robust technique for fabricating three-dimensional (3D) microstructures on a two-dimensional template. Silanization of a surface is often a key step in the liquid lithography process and is used to alter the surface energy of the substrate and, consequently, the shape of the 3D microfeatures produced. In this work, we present a passive technique that allows for the generation of silane gradients along the length of a substrate. The technique relies on a secondary diffusion chamber with a single opening, leading to a directional introduction of silane to the substrate via passive diffusion. The secondary chamber geometry influences the deposited gradient, which is shown to be well captured by Monte Carlo simulations that incorporate the passive diffusion and grafting processes. The technique ultimately allows the user to generate a range of substrate wettabilities on a single chip, enhancing throughput for organ-on-a-chip applications by mimicking the spatial variability of tissue topographies present in vivo.Riley L. HowardFrancesca BernardiMatthew LeffEmma AbeleNancy L. AllbrittonDaniel M. HarrisMDPI AGarticleliquid lithographysilanizationMonte CarlogradientwettabilitymicropillarMechanical engineering and machineryTJ1-1570ENMicromachines, Vol 12, Iss 1360, p 1360 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	liquid lithography silanization Monte Carlo gradient wettability micropillar Mechanical engineering and machinery TJ1-1570
spellingShingle	liquid lithography silanization Monte Carlo gradient wettability micropillar Mechanical engineering and machinery TJ1-1570 Riley L. Howard Francesca Bernardi Matthew Leff Emma Abele Nancy L. Allbritton Daniel M. Harris Passive Control of Silane Diffusion for Gradient Application of Surface Properties
description	Liquid lithography represents a robust technique for fabricating three-dimensional (3D) microstructures on a two-dimensional template. Silanization of a surface is often a key step in the liquid lithography process and is used to alter the surface energy of the substrate and, consequently, the shape of the 3D microfeatures produced. In this work, we present a passive technique that allows for the generation of silane gradients along the length of a substrate. The technique relies on a secondary diffusion chamber with a single opening, leading to a directional introduction of silane to the substrate via passive diffusion. The secondary chamber geometry influences the deposited gradient, which is shown to be well captured by Monte Carlo simulations that incorporate the passive diffusion and grafting processes. The technique ultimately allows the user to generate a range of substrate wettabilities on a single chip, enhancing throughput for organ-on-a-chip applications by mimicking the spatial variability of tissue topographies present in vivo.
format	article
author	Riley L. Howard Francesca Bernardi Matthew Leff Emma Abele Nancy L. Allbritton Daniel M. Harris
author_facet	Riley L. Howard Francesca Bernardi Matthew Leff Emma Abele Nancy L. Allbritton Daniel M. Harris
author_sort	Riley L. Howard
title	Passive Control of Silane Diffusion for Gradient Application of Surface Properties
title_short	Passive Control of Silane Diffusion for Gradient Application of Surface Properties
title_full	Passive Control of Silane Diffusion for Gradient Application of Surface Properties
title_fullStr	Passive Control of Silane Diffusion for Gradient Application of Surface Properties
title_full_unstemmed	Passive Control of Silane Diffusion for Gradient Application of Surface Properties
title_sort	passive control of silane diffusion for gradient application of surface properties
publisher	MDPI AG
publishDate	2021
url	https://doaj.org/article/a715802d20d84dc68a5b2302a0410aaf
work_keys_str_mv	AT rileylhoward passivecontrolofsilanediffusionforgradientapplicationofsurfaceproperties AT francescabernardi passivecontrolofsilanediffusionforgradientapplicationofsurfaceproperties AT matthewleff passivecontrolofsilanediffusionforgradientapplicationofsurfaceproperties AT emmaabele passivecontrolofsilanediffusionforgradientapplicationofsurfaceproperties AT nancylallbritton passivecontrolofsilanediffusionforgradientapplicationofsurfaceproperties AT danielmharris passivecontrolofsilanediffusionforgradientapplicationofsurfaceproperties
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Passive Control of Silane Diffusion for Gradient Application of Surface Properties

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