Selective Growth of Homo-Epitaxial Ag-Nano-Layer on Tribo-Assisted-Reorientation

The growth process and orientational degree of incremental-Ag films with a thickness of 5, 50 and 500 nm, respectively, on reoriented Ag (111) surface were studied by in-situ reflection high-energy electron diffraction (RHEED). The orientation of Ag grains for each incremental-Ag-film was also analy...

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Autores principales:	Minoru Goto, Hiroaki Kobayashi, Koichi Akimoto
Formato:	article
Lenguaje:	EN
Publicado:	Japanese Society of Tribologists 2008
Materias:	ag film si (111) epitaxy selective growth rheed sor xrd reorientation Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999
Acceso en línea:	https://doaj.org/article/a8f0b78dea044778bd37cd40a2953221
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spelling	oai:doaj.org-article:a8f0b78dea044778bd37cd40a29532212021-11-05T09:29:08ZSelective Growth of Homo-Epitaxial Ag-Nano-Layer on Tribo-Assisted-Reorientation1881-219810.2474/trol.3.173https://doaj.org/article/a8f0b78dea044778bd37cd40a29532212008-04-01T00:00:00Zhttps://www.jstage.jst.go.jp/article/trol/3/3/3_3_173/_pdf/-char/enhttps://doaj.org/toc/1881-2198The growth process and orientational degree of incremental-Ag films with a thickness of 5, 50 and 500 nm, respectively, on reoriented Ag (111) surface were studied by in-situ reflection high-energy electron diffraction (RHEED). The orientation of Ag grains for each incremental-Ag-film was also analyzed by synchrotron-orbital-radiated X-ray diffraction (SOR-XRD) to clarify the correlation between the film orientation and the incremental thickness by additional Ag deposition. RHEED observations showed that the incremental-Ag-film grows epitaxially on the reoriented-Ag (111) surface up to 500 nm in thickness. The Ag film, which grew on initial polycrystalline-Ag film, still showed a polycrystalline structure up to 50 nm in thickness, and the Ag (111) orientation is dominant at a thickness of 500 nm. The results of SOR-XRD analysis agreed well with those of RHEED. SOR-XRD analysis showed that the growth rate of Ag {111} grains in the polycrystalline film was also superior to that of other Ag {hkl} grains as the thickness increases. The degree of incremental film orientation increased as the incremental thickness increased, and the advantage in the high orientational degree of the incremental film on the reoriented Ag (111) surface was enhanced when the incremental thickness was within the nanometric range. A new method for selective growth of the epitaxial Ag layer using tribo-assisted reorientation was presented.Minoru GotoHiroaki KobayashiKoichi AkimotoJapanese Society of Tribologistsarticleag filmsi (111)epitaxyselective growthrheedsorxrdreorientationPhysicsQC1-999Engineering (General). Civil engineering (General)TA1-2040Mechanical engineering and machineryTJ1-1570ChemistryQD1-999ENTribology Online, Vol 3, Iss 3, Pp 173-176 (2008)
institution	DOAJ
collection	DOAJ
language	EN
topic	ag film si (111) epitaxy selective growth rheed sor xrd reorientation Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999
spellingShingle	ag film si (111) epitaxy selective growth rheed sor xrd reorientation Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999 Minoru Goto Hiroaki Kobayashi Koichi Akimoto Selective Growth of Homo-Epitaxial Ag-Nano-Layer on Tribo-Assisted-Reorientation
description	The growth process and orientational degree of incremental-Ag films with a thickness of 5, 50 and 500 nm, respectively, on reoriented Ag (111) surface were studied by in-situ reflection high-energy electron diffraction (RHEED). The orientation of Ag grains for each incremental-Ag-film was also analyzed by synchrotron-orbital-radiated X-ray diffraction (SOR-XRD) to clarify the correlation between the film orientation and the incremental thickness by additional Ag deposition. RHEED observations showed that the incremental-Ag-film grows epitaxially on the reoriented-Ag (111) surface up to 500 nm in thickness. The Ag film, which grew on initial polycrystalline-Ag film, still showed a polycrystalline structure up to 50 nm in thickness, and the Ag (111) orientation is dominant at a thickness of 500 nm. The results of SOR-XRD analysis agreed well with those of RHEED. SOR-XRD analysis showed that the growth rate of Ag {111} grains in the polycrystalline film was also superior to that of other Ag {hkl} grains as the thickness increases. The degree of incremental film orientation increased as the incremental thickness increased, and the advantage in the high orientational degree of the incremental film on the reoriented Ag (111) surface was enhanced when the incremental thickness was within the nanometric range. A new method for selective growth of the epitaxial Ag layer using tribo-assisted reorientation was presented.
format	article
author	Minoru Goto Hiroaki Kobayashi Koichi Akimoto
author_facet	Minoru Goto Hiroaki Kobayashi Koichi Akimoto
author_sort	Minoru Goto
title	Selective Growth of Homo-Epitaxial Ag-Nano-Layer on Tribo-Assisted-Reorientation
title_short	Selective Growth of Homo-Epitaxial Ag-Nano-Layer on Tribo-Assisted-Reorientation
title_full	Selective Growth of Homo-Epitaxial Ag-Nano-Layer on Tribo-Assisted-Reorientation
title_fullStr	Selective Growth of Homo-Epitaxial Ag-Nano-Layer on Tribo-Assisted-Reorientation
title_full_unstemmed	Selective Growth of Homo-Epitaxial Ag-Nano-Layer on Tribo-Assisted-Reorientation
title_sort	selective growth of homo-epitaxial ag-nano-layer on tribo-assisted-reorientation
publisher	Japanese Society of Tribologists
publishDate	2008
url	https://doaj.org/article/a8f0b78dea044778bd37cd40a2953221
work_keys_str_mv	AT minorugoto selectivegrowthofhomoepitaxialagnanolayerontriboassistedreorientation AT hiroakikobayashi selectivegrowthofhomoepitaxialagnanolayerontriboassistedreorientation AT koichiakimoto selectivegrowthofhomoepitaxialagnanolayerontriboassistedreorientation
_version_	1718444367083995136

Selective Growth of Homo-Epitaxial Ag-Nano-Layer on Tribo-Assisted-Reorientation

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