Selective Growth of Homo-Epitaxial Ag-Nano-Layer on Tribo-Assisted-Reorientation

The growth process and orientational degree of incremental-Ag films with a thickness of 5, 50 and 500 nm, respectively, on reoriented Ag (111) surface were studied by in-situ reflection high-energy electron diffraction (RHEED). The orientation of Ag grains for each incremental-Ag-film was also analy...

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Autores principales: Minoru Goto, Hiroaki Kobayashi, Koichi Akimoto
Formato: article
Lenguaje:EN
Publicado: Japanese Society of Tribologists 2008
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Acceso en línea:https://doaj.org/article/a8f0b78dea044778bd37cd40a2953221
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