Fabrication of Epitaxial Fe3O4 Film on a Si(111) Substrate
Abstract The application of magnetic oxides in spintronics has recently attracted much attention. The epitaxial growth of magnetic oxide on Si could be the first step of new functional spintronics devices with semiconductors. However, epitaxial spinel ferrite films are generally grown on oxide subst...
Guardado en:
Autores principales: | Nozomi Takahashi, Teodor Huminiuc, Yuta Yamamoto, Takashi Yanase, Toshihiro Shimada, Atsufumi Hirohata, Taro Nagahama |
---|---|
Formato: | article |
Lenguaje: | EN |
Publicado: |
Nature Portfolio
2017
|
Materias: | |
Acceso en línea: | https://doaj.org/article/a9c7909846944b32803ea89da44937da |
Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
Ejemplares similares
-
Investigation of structural and electronic properties of epitaxial graphene on 3C–SiC(100)/Si(100) substrates
por: Gogneau N, et al.
Publicado: (2014) -
Water-Soluble Epitaxial NaCl Thin Film for Fabrication of Flexible Devices
por: Dong Kyu Lee, et al.
Publicado: (2017) -
Enhanced coherence of all-nitride superconducting qubits epitaxially grown on silicon substrate
por: Sunmi Kim, et al.
Publicado: (2021) -
Epitaxial lift-off of freestanding (011) and (111) SrRuO3 thin films using a water sacrificial layer
por: Phu T. P. Le, et al.
Publicado: (2021) -
Thin AIN films growth on Si (III) by hydride vapor phase epitaxy
por: Gorceac, Leonid, et al.
Publicado: (2008)