Effective Synthesis of Highly Oxidized Graphene Oxide That Enables Wafer-scale Nanopatterning: Preformed Acidic Oxidizing Medium Approach

Abstract Demand for rapid and massive-scale exfoliation of bulky graphite remains high in graphene commercialization and property manipulation. We report a procedure utilizing “preformed acidic oxidizing medium (PAOM)” as a modified version of the Hummers’ method for fast and reliable synthesis of g...

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Autores principales:	Chun-Hu Chen, Shin Hu, Jyun-Fu Shih, Chang-Ying Yang, Yun-Wen Luo, Ren-Huai Jhang, Chao-Ming Chiang, Yung-Jr Hung
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2017
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/af28248219b44b4da6d6eb6d29a0c1bc
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spelling	oai:doaj.org-article:af28248219b44b4da6d6eb6d29a0c1bc2021-12-02T16:07:49ZEffective Synthesis of Highly Oxidized Graphene Oxide That Enables Wafer-scale Nanopatterning: Preformed Acidic Oxidizing Medium Approach10.1038/s41598-017-04139-02045-2322https://doaj.org/article/af28248219b44b4da6d6eb6d29a0c1bc2017-06-01T00:00:00Zhttps://doi.org/10.1038/s41598-017-04139-0https://doaj.org/toc/2045-2322Abstract Demand for rapid and massive-scale exfoliation of bulky graphite remains high in graphene commercialization and property manipulation. We report a procedure utilizing “preformed acidic oxidizing medium (PAOM)” as a modified version of the Hummers’ method for fast and reliable synthesis of graphene oxide. Pre-mixing of KMnO4 and concentrated H2SO4 prior to the addition of graphite flakes enables the formation of effectively and efficiently oxidized graphene oxide (EEGO) featured by its high yields and suspension homogeneity. PAOM expedites diffusion of the Mn-oxidants into the graphite galleries, resulting in the rapid graphite oxidation, capable of oxidizing bulky graphite flakes (~0.8 mm in diameter) that can not be realized by the Hummers’ method. In the scale-up tests, ten-time amount of graphite can be completely exfoliated by PAOM without need of extended reaction time. The remarkable suspension homogeneity of EEGO can be exploited to deposit ultra-flat coating for wafer-scale nanopatterning. We successfully fabricated GO optical gratings with well-defined periodicity (300 nm) and uniform thickness (variation <7 nm). The combination of the facile and potent PAOM approach with the wafer-scale patterning technique may realize the goal for massive throughput graphene nanoelectronics.Chun-Hu ChenShin HuJyun-Fu ShihChang-Ying YangYun-Wen LuoRen-Huai JhangChao-Ming ChiangYung-Jr HungNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 7, Iss 1, Pp 1-10 (2017)
institution	DOAJ
collection	DOAJ
language	EN
topic	Medicine R Science Q
spellingShingle	Medicine R Science Q Chun-Hu Chen Shin Hu Jyun-Fu Shih Chang-Ying Yang Yun-Wen Luo Ren-Huai Jhang Chao-Ming Chiang Yung-Jr Hung Effective Synthesis of Highly Oxidized Graphene Oxide That Enables Wafer-scale Nanopatterning: Preformed Acidic Oxidizing Medium Approach
description	Abstract Demand for rapid and massive-scale exfoliation of bulky graphite remains high in graphene commercialization and property manipulation. We report a procedure utilizing “preformed acidic oxidizing medium (PAOM)” as a modified version of the Hummers’ method for fast and reliable synthesis of graphene oxide. Pre-mixing of KMnO4 and concentrated H2SO4 prior to the addition of graphite flakes enables the formation of effectively and efficiently oxidized graphene oxide (EEGO) featured by its high yields and suspension homogeneity. PAOM expedites diffusion of the Mn-oxidants into the graphite galleries, resulting in the rapid graphite oxidation, capable of oxidizing bulky graphite flakes (~0.8 mm in diameter) that can not be realized by the Hummers’ method. In the scale-up tests, ten-time amount of graphite can be completely exfoliated by PAOM without need of extended reaction time. The remarkable suspension homogeneity of EEGO can be exploited to deposit ultra-flat coating for wafer-scale nanopatterning. We successfully fabricated GO optical gratings with well-defined periodicity (300 nm) and uniform thickness (variation <7 nm). The combination of the facile and potent PAOM approach with the wafer-scale patterning technique may realize the goal for massive throughput graphene nanoelectronics.
format	article
author	Chun-Hu Chen Shin Hu Jyun-Fu Shih Chang-Ying Yang Yun-Wen Luo Ren-Huai Jhang Chao-Ming Chiang Yung-Jr Hung
author_facet	Chun-Hu Chen Shin Hu Jyun-Fu Shih Chang-Ying Yang Yun-Wen Luo Ren-Huai Jhang Chao-Ming Chiang Yung-Jr Hung
author_sort	Chun-Hu Chen
title	Effective Synthesis of Highly Oxidized Graphene Oxide That Enables Wafer-scale Nanopatterning: Preformed Acidic Oxidizing Medium Approach
title_short	Effective Synthesis of Highly Oxidized Graphene Oxide That Enables Wafer-scale Nanopatterning: Preformed Acidic Oxidizing Medium Approach
title_full	Effective Synthesis of Highly Oxidized Graphene Oxide That Enables Wafer-scale Nanopatterning: Preformed Acidic Oxidizing Medium Approach
title_fullStr	Effective Synthesis of Highly Oxidized Graphene Oxide That Enables Wafer-scale Nanopatterning: Preformed Acidic Oxidizing Medium Approach
title_full_unstemmed	Effective Synthesis of Highly Oxidized Graphene Oxide That Enables Wafer-scale Nanopatterning: Preformed Acidic Oxidizing Medium Approach
title_sort	effective synthesis of highly oxidized graphene oxide that enables wafer-scale nanopatterning: preformed acidic oxidizing medium approach
publisher	Nature Portfolio
publishDate	2017
url	https://doaj.org/article/af28248219b44b4da6d6eb6d29a0c1bc
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Effective Synthesis of Highly Oxidized Graphene Oxide That Enables Wafer-scale Nanopatterning: Preformed Acidic Oxidizing Medium Approach

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