Methods of trichlorosilane synthesis for polycrystalline silicon production. Part 1: Direct synthesis

Novel technical solutions and ideas for increasing the yield of solar and semiconductor grade polycrystalline silicon processes have been analyzed. The predominant polycrystalline silicon technology is currently still the Siemens process including the conversion of technical grade silicon (synthesiz...

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Autores principales:	Vladimir N. Jarkin, Oleg A. Kisarin, Tatyana V. Kritskaya
Formato:	article
Lenguaje:	EN
Publicado:	Pensoft Publishers 2021
Materias:	Electronics TK7800-8360
Acceso en línea:	https://doaj.org/article/b06798a64b184177b2bf316d7486b84f
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spelling	oai:doaj.org-article:b06798a64b184177b2bf316d7486b84f2021-11-09T04:30:07ZMethods of trichlorosilane synthesis for polycrystalline silicon production. Part 1: Direct synthesis10.3897/j.moem.7.1.649532452-1779https://doaj.org/article/b06798a64b184177b2bf316d7486b84f2021-03-01T00:00:00Zhttps://moem.pensoft.net/article/64953/download/pdf/https://moem.pensoft.net/article/64953/download/xml/https://moem.pensoft.net/article/64953/https://doaj.org/toc/2452-1779Novel technical solutions and ideas for increasing the yield of solar and semiconductor grade polycrystalline silicon processes have been analyzed. The predominant polycrystalline silicon technology is currently still the Siemens process including the conversion of technical grade silicon (synthesized by carbon-thermal reduction of quartzites) to trichlorosilane followed by rectification and hydrogen reduction. The cost of product silicon can be cut down by reducing the trichlorosilane synthesis costs through process and equipment improvement. Advantages, drawbacks and production cost reduction methods have been considered with respect to four common trichlorosilane synthesis processes: hydrogen chloride exposure of technical grade silicon (direct chlorination, DC), homogeneous hydration of tetrachlorosilane (conversion), tetrachlorosilane and hydrogen exposure of silicon (hydro chlorination silicon, HC), and catalyzed tetrachlorosilane and dichlorosilane reaction (redistribution of anti-disproportioning reaction). These processes remain in use and are permanently improved. Catalytic processes play an important role on silicon surface, and understanding their mechanisms can help find novel applications and obtain new results. It has been noted that indispensable components of various equipment and process designs are recycling steps and combined processes including active distillation. They provide for the most complete utilization of raw trichlorosilane, increase the process yield and cut down silicon cost.Vladimir N. JarkinOleg A. KisarinTatyana V. KritskayaPensoft PublishersarticleElectronicsTK7800-8360ENModern Electronic Materials, Vol 7, Iss 1, Pp 1-10 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Electronics TK7800-8360
spellingShingle	Electronics TK7800-8360 Vladimir N. Jarkin Oleg A. Kisarin Tatyana V. Kritskaya Methods of trichlorosilane synthesis for polycrystalline silicon production. Part 1: Direct synthesis
description	Novel technical solutions and ideas for increasing the yield of solar and semiconductor grade polycrystalline silicon processes have been analyzed. The predominant polycrystalline silicon technology is currently still the Siemens process including the conversion of technical grade silicon (synthesized by carbon-thermal reduction of quartzites) to trichlorosilane followed by rectification and hydrogen reduction. The cost of product silicon can be cut down by reducing the trichlorosilane synthesis costs through process and equipment improvement. Advantages, drawbacks and production cost reduction methods have been considered with respect to four common trichlorosilane synthesis processes: hydrogen chloride exposure of technical grade silicon (direct chlorination, DC), homogeneous hydration of tetrachlorosilane (conversion), tetrachlorosilane and hydrogen exposure of silicon (hydro chlorination silicon, HC), and catalyzed tetrachlorosilane and dichlorosilane reaction (redistribution of anti-disproportioning reaction). These processes remain in use and are permanently improved. Catalytic processes play an important role on silicon surface, and understanding their mechanisms can help find novel applications and obtain new results. It has been noted that indispensable components of various equipment and process designs are recycling steps and combined processes including active distillation. They provide for the most complete utilization of raw trichlorosilane, increase the process yield and cut down silicon cost.
format	article
author	Vladimir N. Jarkin Oleg A. Kisarin Tatyana V. Kritskaya
author_facet	Vladimir N. Jarkin Oleg A. Kisarin Tatyana V. Kritskaya
author_sort	Vladimir N. Jarkin
title	Methods of trichlorosilane synthesis for polycrystalline silicon production. Part 1: Direct synthesis
title_short	Methods of trichlorosilane synthesis for polycrystalline silicon production. Part 1: Direct synthesis
title_full	Methods of trichlorosilane synthesis for polycrystalline silicon production. Part 1: Direct synthesis
title_fullStr	Methods of trichlorosilane synthesis for polycrystalline silicon production. Part 1: Direct synthesis
title_full_unstemmed	Methods of trichlorosilane synthesis for polycrystalline silicon production. Part 1: Direct synthesis
title_sort	methods of trichlorosilane synthesis for polycrystalline silicon production. part 1: direct synthesis
publisher	Pensoft Publishers
publishDate	2021
url	https://doaj.org/article/b06798a64b184177b2bf316d7486b84f
work_keys_str_mv	AT vladimirnjarkin methodsoftrichlorosilanesynthesisforpolycrystallinesiliconproductionpart1directsynthesis AT olegakisarin methodsoftrichlorosilanesynthesisforpolycrystallinesiliconproductionpart1directsynthesis AT tatyanavkritskaya methodsoftrichlorosilanesynthesisforpolycrystallinesiliconproductionpart1directsynthesis
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Methods of trichlorosilane synthesis for polycrystalline silicon production. Part 1: Direct synthesis

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