Cita APA (7a ed.)

Ma, D., Zhao, Y., & Zeng, L. (2017). Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment. Nature Portfolio.

Cita Chicago Style (17a ed.)

Ma, Donghan, Yuxuan Zhao, y Lijiang Zeng. Achieving Unlimited Recording Length in Interference Lithography via Broad-beam Scanning Exposure with Self-referencing Alignment. Nature Portfolio, 2017.

Cita MLA (8a ed.)

Ma, Donghan, et al. Achieving Unlimited Recording Length in Interference Lithography via Broad-beam Scanning Exposure with Self-referencing Alignment. Nature Portfolio, 2017.