Ma, D., Zhao, Y., & Zeng, L. (2017). Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment. Nature Portfolio.
Style de citation Chicago (17e éd.)Ma, Donghan, Yuxuan Zhao, et Lijiang Zeng. Achieving Unlimited Recording Length in Interference Lithography via Broad-beam Scanning Exposure with Self-referencing Alignment. Nature Portfolio, 2017.
Style de citation MLA (8e éd.)Ma, Donghan, et al. Achieving Unlimited Recording Length in Interference Lithography via Broad-beam Scanning Exposure with Self-referencing Alignment. Nature Portfolio, 2017.
Attention : ces citations peuvent ne pas être correctes à 100%.