Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment

Abstract Large-area holographic gratings are of great importance in diverse fields including long-range interference metrology, high-resolution astronomical telescopes, and chirped-pulse-amplification systems. However, in conventional interference lithography, the recording length is limited by the...

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Autores principales:	Donghan Ma, Yuxuan Zhao, Lijiang Zeng
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2017
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/b191567d24d441f1968fe496631d1708
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spelling	oai:doaj.org-article:b191567d24d441f1968fe496631d17082021-12-02T12:32:41ZAchieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment10.1038/s41598-017-01099-32045-2322https://doaj.org/article/b191567d24d441f1968fe496631d17082017-04-01T00:00:00Zhttps://doi.org/10.1038/s41598-017-01099-3https://doaj.org/toc/2045-2322Abstract Large-area holographic gratings are of great importance in diverse fields including long-range interference metrology, high-resolution astronomical telescopes, and chirped-pulse-amplification systems. However, in conventional interference lithography, the recording length is limited by the aperture of the collimating lenses. Here we propose broad-beam scanning exposure which employs the latent grating generated continuously during scanning for real-time dynamic fringe locking and thus achieves unlimited recording length. This method is experimentally proved to make high-quality gratings, and is expected to be a new type of interference lithography.Donghan MaYuxuan ZhaoLijiang ZengNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 7, Iss 1, Pp 1-10 (2017)
institution	DOAJ
collection	DOAJ
language	EN
topic	Medicine R Science Q
spellingShingle	Medicine R Science Q Donghan Ma Yuxuan Zhao Lijiang Zeng Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment
description	Abstract Large-area holographic gratings are of great importance in diverse fields including long-range interference metrology, high-resolution astronomical telescopes, and chirped-pulse-amplification systems. However, in conventional interference lithography, the recording length is limited by the aperture of the collimating lenses. Here we propose broad-beam scanning exposure which employs the latent grating generated continuously during scanning for real-time dynamic fringe locking and thus achieves unlimited recording length. This method is experimentally proved to make high-quality gratings, and is expected to be a new type of interference lithography.
format	article
author	Donghan Ma Yuxuan Zhao Lijiang Zeng
author_facet	Donghan Ma Yuxuan Zhao Lijiang Zeng
author_sort	Donghan Ma
title	Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment
title_short	Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment
title_full	Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment
title_fullStr	Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment
title_full_unstemmed	Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment
title_sort	achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment
publisher	Nature Portfolio
publishDate	2017
url	https://doaj.org/article/b191567d24d441f1968fe496631d1708
work_keys_str_mv	AT donghanma achievingunlimitedrecordinglengthininterferencelithographyviabroadbeamscanningexposurewithselfreferencingalignment AT yuxuanzhao achievingunlimitedrecordinglengthininterferencelithographyviabroadbeamscanningexposurewithselfreferencingalignment AT lijiangzeng achievingunlimitedrecordinglengthininterferencelithographyviabroadbeamscanningexposurewithselfreferencingalignment
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Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment

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