Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment

Abstract Large-area holographic gratings are of great importance in diverse fields including long-range interference metrology, high-resolution astronomical telescopes, and chirped-pulse-amplification systems. However, in conventional interference lithography, the recording length is limited by the...

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Autores principales: Donghan Ma, Yuxuan Zhao, Lijiang Zeng
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2017
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Acceso en línea:https://doaj.org/article/b191567d24d441f1968fe496631d1708
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