Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment
Abstract Large-area holographic gratings are of great importance in diverse fields including long-range interference metrology, high-resolution astronomical telescopes, and chirped-pulse-amplification systems. However, in conventional interference lithography, the recording length is limited by the...
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Auteurs principaux: | Donghan Ma, Yuxuan Zhao, Lijiang Zeng |
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Format: | article |
Langue: | EN |
Publié: |
Nature Portfolio
2017
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Accès en ligne: | https://doaj.org/article/b191567d24d441f1968fe496631d1708 |
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