In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic

Abstract This article presents a millimeter-wave diagnostic for the in-situ monitoring of liquid metal jetting additive manufacturing systems. The diagnostic leverages a T-junction waveguide device to monitor impedance changes due to jetted metal droplets in real time. An analytical formulation for...

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Autores principales:	Tammy Chang, Saptarshi Mukherjee, Nicholas N. Watkins, David M. Stobbe, Owen Mays, Emer V. Baluyot, Andrew J. Pascall, Joseph W. Tringe
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2020
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/b44edb11975245e2a30ea41c1cf4e142
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spelling	oai:doaj.org-article:b44edb11975245e2a30ea41c1cf4e1422021-12-02T12:42:19ZIn-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic10.1038/s41598-020-79266-22045-2322https://doaj.org/article/b44edb11975245e2a30ea41c1cf4e1422020-12-01T00:00:00Zhttps://doi.org/10.1038/s41598-020-79266-2https://doaj.org/toc/2045-2322Abstract This article presents a millimeter-wave diagnostic for the in-situ monitoring of liquid metal jetting additive manufacturing systems. The diagnostic leverages a T-junction waveguide device to monitor impedance changes due to jetted metal droplets in real time. An analytical formulation for the time-domain T-junction operation is presented and supported with a quasi-static full-wave electromagnetic simulation model. The approach is evaluated experimentally with metallic spheres of known diameters ranging from 0.79 to 3.18 mm. It is then demonstrated in a custom drop-on-demand liquid metal jetting system where effective droplet diameters ranging from 0.8 to 1.6 mm are detected. Experimental results demonstrate that this approach can provide information about droplet size, timing, and motion by monitoring a single parameter, the reflection coefficient amplitude at the input port. These results show the promise of the impedance diagnostic as a reliable in-situ characterization method for metal droplets in an advanced manufacturing system.Tammy ChangSaptarshi MukherjeeNicholas N. WatkinsDavid M. StobbeOwen MaysEmer V. BaluyotAndrew J. PascallJoseph W. TringeNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 10, Iss 1, Pp 1-9 (2020)
institution	DOAJ
collection	DOAJ
language	EN
topic	Medicine R Science Q
spellingShingle	Medicine R Science Q Tammy Chang Saptarshi Mukherjee Nicholas N. Watkins David M. Stobbe Owen Mays Emer V. Baluyot Andrew J. Pascall Joseph W. Tringe In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic
description	Abstract This article presents a millimeter-wave diagnostic for the in-situ monitoring of liquid metal jetting additive manufacturing systems. The diagnostic leverages a T-junction waveguide device to monitor impedance changes due to jetted metal droplets in real time. An analytical formulation for the time-domain T-junction operation is presented and supported with a quasi-static full-wave electromagnetic simulation model. The approach is evaluated experimentally with metallic spheres of known diameters ranging from 0.79 to 3.18 mm. It is then demonstrated in a custom drop-on-demand liquid metal jetting system where effective droplet diameters ranging from 0.8 to 1.6 mm are detected. Experimental results demonstrate that this approach can provide information about droplet size, timing, and motion by monitoring a single parameter, the reflection coefficient amplitude at the input port. These results show the promise of the impedance diagnostic as a reliable in-situ characterization method for metal droplets in an advanced manufacturing system.
format	article
author	Tammy Chang Saptarshi Mukherjee Nicholas N. Watkins David M. Stobbe Owen Mays Emer V. Baluyot Andrew J. Pascall Joseph W. Tringe
author_facet	Tammy Chang Saptarshi Mukherjee Nicholas N. Watkins David M. Stobbe Owen Mays Emer V. Baluyot Andrew J. Pascall Joseph W. Tringe
author_sort	Tammy Chang
title	In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic
title_short	In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic
title_full	In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic
title_fullStr	In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic
title_full_unstemmed	In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic
title_sort	in-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic
publisher	Nature Portfolio
publishDate	2020
url	https://doaj.org/article/b44edb11975245e2a30ea41c1cf4e142
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In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic

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