In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic
Abstract This article presents a millimeter-wave diagnostic for the in-situ monitoring of liquid metal jetting additive manufacturing systems. The diagnostic leverages a T-junction waveguide device to monitor impedance changes due to jetted metal droplets in real time. An analytical formulation for...
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Autores principales: | Tammy Chang, Saptarshi Mukherjee, Nicholas N. Watkins, David M. Stobbe, Owen Mays, Emer V. Baluyot, Andrew J. Pascall, Joseph W. Tringe |
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Formato: | article |
Lenguaje: | EN |
Publicado: |
Nature Portfolio
2020
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Materias: | |
Acceso en línea: | https://doaj.org/article/b44edb11975245e2a30ea41c1cf4e142 |
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