In-situ monitoring for liquid metal jetting using a millimeter-wave impedance diagnostic

Abstract This article presents a millimeter-wave diagnostic for the in-situ monitoring of liquid metal jetting additive manufacturing systems. The diagnostic leverages a T-junction waveguide device to monitor impedance changes due to jetted metal droplets in real time. An analytical formulation for...

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Autores principales: Tammy Chang, Saptarshi Mukherjee, Nicholas N. Watkins, David M. Stobbe, Owen Mays, Emer V. Baluyot, Andrew J. Pascall, Joseph W. Tringe
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2020
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Acceso en línea:https://doaj.org/article/b44edb11975245e2a30ea41c1cf4e142
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