Stable Field Emission from Vertically Oriented SiC Nanoarrays

Silicon carbide (SiC) nanostructure is a type of promising field emitter due to high breakdown field strength, high thermal conductivity, low electron affinity, and high electron mobility. However, the fabrication of the SiC nanotips array is difficult due to its chemical inertness. Here we report a...

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Autores principales: Jianfeng Xiao, Jiuzhou Zhao, Guanjiang Liu, Mattew Thomas Cole, Shenghan Zhou, Ke Chen, Xinchuan Liu, Zhenjun Li, Chi Li, Qing Dai
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Lenguaje:EN
Publicado: MDPI AG 2021
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Acceso en línea:https://doaj.org/article/b46dfd825cd849e8a0455cf268eb5370
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spelling oai:doaj.org-article:b46dfd825cd849e8a0455cf268eb53702021-11-25T18:31:49ZStable Field Emission from Vertically Oriented SiC Nanoarrays10.3390/nano111130252079-4991https://doaj.org/article/b46dfd825cd849e8a0455cf268eb53702021-11-01T00:00:00Zhttps://www.mdpi.com/2079-4991/11/11/3025https://doaj.org/toc/2079-4991Silicon carbide (SiC) nanostructure is a type of promising field emitter due to high breakdown field strength, high thermal conductivity, low electron affinity, and high electron mobility. However, the fabrication of the SiC nanotips array is difficult due to its chemical inertness. Here we report a simple, industry-familiar reactive ion etching to fabricate well-aligned, vertically orientated SiC nanoarrays on 4H-SiC wafers. The as-synthesized nanoarrays had tapered base angles >60°, and were vertically oriented with a high packing density >10<sup>7</sup> mm<sup>−2</sup> and high-aspect ratios of approximately 35. As a result of its high geometry uniformity—5% length variation and 10% diameter variation, the field emitter array showed typical turn-on fields of 4.3 V μm<sup>−1</sup> and a high field-enhancement factor of ~1260. The 8 h current emission stability displayed a mean current fluctuation of 1.9 ± 1%, revealing excellent current emission stability. The as-synthesized emitters demonstrate competitive emission performance that highlights their potential in a variety of vacuum electronics applications. This study provides a new route to realizing scalable field electron emitter production.Jianfeng XiaoJiuzhou ZhaoGuanjiang LiuMattew Thomas ColeShenghan ZhouKe ChenXinchuan LiuZhenjun LiChi LiQing DaiMDPI AGarticlesilicon carbideone-dimensional nanomaterialsnanoarraysfield emissionChemistryQD1-999ENNanomaterials, Vol 11, Iss 3025, p 3025 (2021)
institution DOAJ
collection DOAJ
language EN
topic silicon carbide
one-dimensional nanomaterials
nanoarrays
field emission
Chemistry
QD1-999
spellingShingle silicon carbide
one-dimensional nanomaterials
nanoarrays
field emission
Chemistry
QD1-999
Jianfeng Xiao
Jiuzhou Zhao
Guanjiang Liu
Mattew Thomas Cole
Shenghan Zhou
Ke Chen
Xinchuan Liu
Zhenjun Li
Chi Li
Qing Dai
Stable Field Emission from Vertically Oriented SiC Nanoarrays
description Silicon carbide (SiC) nanostructure is a type of promising field emitter due to high breakdown field strength, high thermal conductivity, low electron affinity, and high electron mobility. However, the fabrication of the SiC nanotips array is difficult due to its chemical inertness. Here we report a simple, industry-familiar reactive ion etching to fabricate well-aligned, vertically orientated SiC nanoarrays on 4H-SiC wafers. The as-synthesized nanoarrays had tapered base angles >60°, and were vertically oriented with a high packing density >10<sup>7</sup> mm<sup>−2</sup> and high-aspect ratios of approximately 35. As a result of its high geometry uniformity—5% length variation and 10% diameter variation, the field emitter array showed typical turn-on fields of 4.3 V μm<sup>−1</sup> and a high field-enhancement factor of ~1260. The 8 h current emission stability displayed a mean current fluctuation of 1.9 ± 1%, revealing excellent current emission stability. The as-synthesized emitters demonstrate competitive emission performance that highlights their potential in a variety of vacuum electronics applications. This study provides a new route to realizing scalable field electron emitter production.
format article
author Jianfeng Xiao
Jiuzhou Zhao
Guanjiang Liu
Mattew Thomas Cole
Shenghan Zhou
Ke Chen
Xinchuan Liu
Zhenjun Li
Chi Li
Qing Dai
author_facet Jianfeng Xiao
Jiuzhou Zhao
Guanjiang Liu
Mattew Thomas Cole
Shenghan Zhou
Ke Chen
Xinchuan Liu
Zhenjun Li
Chi Li
Qing Dai
author_sort Jianfeng Xiao
title Stable Field Emission from Vertically Oriented SiC Nanoarrays
title_short Stable Field Emission from Vertically Oriented SiC Nanoarrays
title_full Stable Field Emission from Vertically Oriented SiC Nanoarrays
title_fullStr Stable Field Emission from Vertically Oriented SiC Nanoarrays
title_full_unstemmed Stable Field Emission from Vertically Oriented SiC Nanoarrays
title_sort stable field emission from vertically oriented sic nanoarrays
publisher MDPI AG
publishDate 2021
url https://doaj.org/article/b46dfd825cd849e8a0455cf268eb5370
work_keys_str_mv AT jianfengxiao stablefieldemissionfromverticallyorientedsicnanoarrays
AT jiuzhouzhao stablefieldemissionfromverticallyorientedsicnanoarrays
AT guanjiangliu stablefieldemissionfromverticallyorientedsicnanoarrays
AT mattewthomascole stablefieldemissionfromverticallyorientedsicnanoarrays
AT shenghanzhou stablefieldemissionfromverticallyorientedsicnanoarrays
AT kechen stablefieldemissionfromverticallyorientedsicnanoarrays
AT xinchuanliu stablefieldemissionfromverticallyorientedsicnanoarrays
AT zhenjunli stablefieldemissionfromverticallyorientedsicnanoarrays
AT chili stablefieldemissionfromverticallyorientedsicnanoarrays
AT qingdai stablefieldemissionfromverticallyorientedsicnanoarrays
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