3D electron-beam writing at sub-15 nm resolution using spider silk as a resist

Electron beam lithography (EBL) is renowned to provide fabrication resolution in the deep nanometer scale but their incapability of arbitrary 3D nanofabrication poses a major limitation to the technique. Here, the authors demonstrate a manufacturing technique of functional 3d nanostructures at a res...

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Autores principales:	Nan Qin, Zhi-Gang Qian, Chengzhe Zhou, Xiao-Xia Xia, Tiger H. Tao
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2021
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/ba81b030aa21481890ca612033e8837f
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spelling	oai:doaj.org-article:ba81b030aa21481890ca612033e8837f2021-12-02T16:35:07Z3D electron-beam writing at sub-15 nm resolution using spider silk as a resist10.1038/s41467-021-25470-12041-1723https://doaj.org/article/ba81b030aa21481890ca612033e8837f2021-08-01T00:00:00Zhttps://doi.org/10.1038/s41467-021-25470-1https://doaj.org/toc/2041-1723Electron beam lithography (EBL) is renowned to provide fabrication resolution in the deep nanometer scale but their incapability of arbitrary 3D nanofabrication poses a major limitation to the technique. Here, the authors demonstrate a manufacturing technique of functional 3d nanostructures at a resolution of sub-15 nm using voltage-regulated 3d EBL.Nan QinZhi-Gang QianChengzhe ZhouXiao-Xia XiaTiger H. TaoNature PortfolioarticleScienceQENNature Communications, Vol 12, Iss 1, Pp 1-10 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q Nan Qin Zhi-Gang Qian Chengzhe Zhou Xiao-Xia Xia Tiger H. Tao 3D electron-beam writing at sub-15 nm resolution using spider silk as a resist
description	Electron beam lithography (EBL) is renowned to provide fabrication resolution in the deep nanometer scale but their incapability of arbitrary 3D nanofabrication poses a major limitation to the technique. Here, the authors demonstrate a manufacturing technique of functional 3d nanostructures at a resolution of sub-15 nm using voltage-regulated 3d EBL.
format	article
author	Nan Qin Zhi-Gang Qian Chengzhe Zhou Xiao-Xia Xia Tiger H. Tao
author_facet	Nan Qin Zhi-Gang Qian Chengzhe Zhou Xiao-Xia Xia Tiger H. Tao
author_sort	Nan Qin
title	3D electron-beam writing at sub-15 nm resolution using spider silk as a resist
title_short	3D electron-beam writing at sub-15 nm resolution using spider silk as a resist
title_full	3D electron-beam writing at sub-15 nm resolution using spider silk as a resist
title_fullStr	3D electron-beam writing at sub-15 nm resolution using spider silk as a resist
title_full_unstemmed	3D electron-beam writing at sub-15 nm resolution using spider silk as a resist
title_sort	3d electron-beam writing at sub-15 nm resolution using spider silk as a resist
publisher	Nature Portfolio
publishDate	2021
url	https://doaj.org/article/ba81b030aa21481890ca612033e8837f
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3D electron-beam writing at sub-15 nm resolution using spider silk as a resist

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