3D electron-beam writing at sub-15 nm resolution using spider silk as a resist
Electron beam lithography (EBL) is renowned to provide fabrication resolution in the deep nanometer scale but their incapability of arbitrary 3D nanofabrication poses a major limitation to the technique. Here, the authors demonstrate a manufacturing technique of functional 3d nanostructures at a res...
Guardado en:
| Autores principales: | , , , , |
|---|---|
| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
Nature Portfolio
2021
|
| Materias: | |
| Acceso en línea: | https://doaj.org/article/ba81b030aa21481890ca612033e8837f |
| Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|