Mechanical cleaning of graphene using in situ electron microscopy

Contamination of 2D materials adversely impacts device performance and calls for cleaning methods down to the atomic scale and over large areas. Here, the authors present a site-specific mechanical cleaning approach capable of cleaning both sides of suspended 2D membranes and achieving atomically cl...

Descripción completa

Guardado en:

Detalles Bibliográficos
Autores principales:	Peter Schweizer, Christian Dolle, Daniela Dasler, Gonzalo Abellán, Frank Hauke, Andreas Hirsch, Erdmann Spiecker
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2020
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/bceb979c9b3245528e032bcbf801fc91
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

id	oai:doaj.org-article:bceb979c9b3245528e032bcbf801fc91
record_format	dspace
spelling	oai:doaj.org-article:bceb979c9b3245528e032bcbf801fc912021-12-02T16:49:29ZMechanical cleaning of graphene using in situ electron microscopy10.1038/s41467-020-15255-32041-1723https://doaj.org/article/bceb979c9b3245528e032bcbf801fc912020-04-01T00:00:00Zhttps://doi.org/10.1038/s41467-020-15255-3https://doaj.org/toc/2041-1723Contamination of 2D materials adversely impacts device performance and calls for cleaning methods down to the atomic scale and over large areas. Here, the authors present a site-specific mechanical cleaning approach capable of cleaning both sides of suspended 2D membranes and achieving atomically clean areas of several μm2 within minutes.Peter SchweizerChristian DolleDaniela DaslerGonzalo AbellánFrank HaukeAndreas HirschErdmann SpieckerNature PortfolioarticleScienceQENNature Communications, Vol 11, Iss 1, Pp 1-9 (2020)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q Peter Schweizer Christian Dolle Daniela Dasler Gonzalo Abellán Frank Hauke Andreas Hirsch Erdmann Spiecker Mechanical cleaning of graphene using in situ electron microscopy
description	Contamination of 2D materials adversely impacts device performance and calls for cleaning methods down to the atomic scale and over large areas. Here, the authors present a site-specific mechanical cleaning approach capable of cleaning both sides of suspended 2D membranes and achieving atomically clean areas of several μm2 within minutes.
format	article
author	Peter Schweizer Christian Dolle Daniela Dasler Gonzalo Abellán Frank Hauke Andreas Hirsch Erdmann Spiecker
author_facet	Peter Schweizer Christian Dolle Daniela Dasler Gonzalo Abellán Frank Hauke Andreas Hirsch Erdmann Spiecker
author_sort	Peter Schweizer
title	Mechanical cleaning of graphene using in situ electron microscopy
title_short	Mechanical cleaning of graphene using in situ electron microscopy
title_full	Mechanical cleaning of graphene using in situ electron microscopy
title_fullStr	Mechanical cleaning of graphene using in situ electron microscopy
title_full_unstemmed	Mechanical cleaning of graphene using in situ electron microscopy
title_sort	mechanical cleaning of graphene using in situ electron microscopy
publisher	Nature Portfolio
publishDate	2020
url	https://doaj.org/article/bceb979c9b3245528e032bcbf801fc91
work_keys_str_mv	AT peterschweizer mechanicalcleaningofgrapheneusinginsituelectronmicroscopy AT christiandolle mechanicalcleaningofgrapheneusinginsituelectronmicroscopy AT danieladasler mechanicalcleaningofgrapheneusinginsituelectronmicroscopy AT gonzaloabellan mechanicalcleaningofgrapheneusinginsituelectronmicroscopy AT frankhauke mechanicalcleaningofgrapheneusinginsituelectronmicroscopy AT andreashirsch mechanicalcleaningofgrapheneusinginsituelectronmicroscopy AT erdmannspiecker mechanicalcleaningofgrapheneusinginsituelectronmicroscopy
_version_	1718383300266950656

Mechanical cleaning of graphene using in situ electron microscopy

Ejemplares similares