Proximity Effect induced transport Properties between MBE grown (Bi1−xSbx)2Se3 Topological Insulators and Magnetic Insulator CoFe2O4

Abstract In this study, we investigate the proximity effect in topological insulator (TI) and magnetic insulator bilayer system. (Bi1−xSbx)2Se3/CoFe2O4 (CFO) heterostructure was fabricated using molecular beam epitaxy and pulsed laser deposition system respectively. As revealed from the magnetoresis...

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Autores principales: Shun-Yu Huang, Cheong-Wei Chong, Yi Tung, Tzu-Chin Chen, Ki-Chi Wu, Min-Kai Lee, Jung-Chun-Andrew Huang, Z. Li, H. Qiu
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Publicado: Nature Portfolio 2017
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spelling oai:doaj.org-article:bdc70b5e19184bc7a16a1f00dafed58c2021-12-02T15:06:14ZProximity Effect induced transport Properties between MBE grown (Bi1−xSbx)2Se3 Topological Insulators and Magnetic Insulator CoFe2O410.1038/s41598-017-02662-82045-2322https://doaj.org/article/bdc70b5e19184bc7a16a1f00dafed58c2017-05-01T00:00:00Zhttps://doi.org/10.1038/s41598-017-02662-8https://doaj.org/toc/2045-2322Abstract In this study, we investigate the proximity effect in topological insulator (TI) and magnetic insulator bilayer system. (Bi1−xSbx)2Se3/CoFe2O4 (CFO) heterostructure was fabricated using molecular beam epitaxy and pulsed laser deposition system respectively. As revealed from the magnetoresistance measurement, the weak anti-localization (WAL) is strongly suppressed by proximity effect in (Bi1−xSbx)2Se3/CFO interface. Modified Hikama-Larkin-Nagaoka equation was used to fit the WAL results so that the size of surface state gap can be extracted successfully. The temperature-dependent resistance of the heterostructures at small and large perpendicular magnetic fields were also measured and analyzed. The results indicate that the surface band gap can be induced in TI and continuously enlarged up to 9 T, indicating the gradual alignment of the magnetic moment in CFO under perpendicular magnetic field. The approaches and results accommodated in this work show that CFO can effectively magnetize (Bi1−xSbx)2Se3 and the heterostructures are promising for TI-based spintronic device applications.Shun-Yu HuangCheong-Wei ChongYi TungTzu-Chin ChenKi-Chi WuMin-Kai LeeJung-Chun-Andrew HuangZ. LiH. QiuNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 7, Iss 1, Pp 1-7 (2017)
institution DOAJ
collection DOAJ
language EN
topic Medicine
R
Science
Q
spellingShingle Medicine
R
Science
Q
Shun-Yu Huang
Cheong-Wei Chong
Yi Tung
Tzu-Chin Chen
Ki-Chi Wu
Min-Kai Lee
Jung-Chun-Andrew Huang
Z. Li
H. Qiu
Proximity Effect induced transport Properties between MBE grown (Bi1−xSbx)2Se3 Topological Insulators and Magnetic Insulator CoFe2O4
description Abstract In this study, we investigate the proximity effect in topological insulator (TI) and magnetic insulator bilayer system. (Bi1−xSbx)2Se3/CoFe2O4 (CFO) heterostructure was fabricated using molecular beam epitaxy and pulsed laser deposition system respectively. As revealed from the magnetoresistance measurement, the weak anti-localization (WAL) is strongly suppressed by proximity effect in (Bi1−xSbx)2Se3/CFO interface. Modified Hikama-Larkin-Nagaoka equation was used to fit the WAL results so that the size of surface state gap can be extracted successfully. The temperature-dependent resistance of the heterostructures at small and large perpendicular magnetic fields were also measured and analyzed. The results indicate that the surface band gap can be induced in TI and continuously enlarged up to 9 T, indicating the gradual alignment of the magnetic moment in CFO under perpendicular magnetic field. The approaches and results accommodated in this work show that CFO can effectively magnetize (Bi1−xSbx)2Se3 and the heterostructures are promising for TI-based spintronic device applications.
format article
author Shun-Yu Huang
Cheong-Wei Chong
Yi Tung
Tzu-Chin Chen
Ki-Chi Wu
Min-Kai Lee
Jung-Chun-Andrew Huang
Z. Li
H. Qiu
author_facet Shun-Yu Huang
Cheong-Wei Chong
Yi Tung
Tzu-Chin Chen
Ki-Chi Wu
Min-Kai Lee
Jung-Chun-Andrew Huang
Z. Li
H. Qiu
author_sort Shun-Yu Huang
title Proximity Effect induced transport Properties between MBE grown (Bi1−xSbx)2Se3 Topological Insulators and Magnetic Insulator CoFe2O4
title_short Proximity Effect induced transport Properties between MBE grown (Bi1−xSbx)2Se3 Topological Insulators and Magnetic Insulator CoFe2O4
title_full Proximity Effect induced transport Properties between MBE grown (Bi1−xSbx)2Se3 Topological Insulators and Magnetic Insulator CoFe2O4
title_fullStr Proximity Effect induced transport Properties between MBE grown (Bi1−xSbx)2Se3 Topological Insulators and Magnetic Insulator CoFe2O4
title_full_unstemmed Proximity Effect induced transport Properties between MBE grown (Bi1−xSbx)2Se3 Topological Insulators and Magnetic Insulator CoFe2O4
title_sort proximity effect induced transport properties between mbe grown (bi1−xsbx)2se3 topological insulators and magnetic insulator cofe2o4
publisher Nature Portfolio
publishDate 2017
url https://doaj.org/article/bdc70b5e19184bc7a16a1f00dafed58c
work_keys_str_mv AT shunyuhuang proximityeffectinducedtransportpropertiesbetweenmbegrownbi1xsbx2se3topologicalinsulatorsandmagneticinsulatorcofe2o4
AT cheongweichong proximityeffectinducedtransportpropertiesbetweenmbegrownbi1xsbx2se3topologicalinsulatorsandmagneticinsulatorcofe2o4
AT yitung proximityeffectinducedtransportpropertiesbetweenmbegrownbi1xsbx2se3topologicalinsulatorsandmagneticinsulatorcofe2o4
AT tzuchinchen proximityeffectinducedtransportpropertiesbetweenmbegrownbi1xsbx2se3topologicalinsulatorsandmagneticinsulatorcofe2o4
AT kichiwu proximityeffectinducedtransportpropertiesbetweenmbegrownbi1xsbx2se3topologicalinsulatorsandmagneticinsulatorcofe2o4
AT minkailee proximityeffectinducedtransportpropertiesbetweenmbegrownbi1xsbx2se3topologicalinsulatorsandmagneticinsulatorcofe2o4
AT jungchunandrewhuang proximityeffectinducedtransportpropertiesbetweenmbegrownbi1xsbx2se3topologicalinsulatorsandmagneticinsulatorcofe2o4
AT zli proximityeffectinducedtransportpropertiesbetweenmbegrownbi1xsbx2se3topologicalinsulatorsandmagneticinsulatorcofe2o4
AT hqiu proximityeffectinducedtransportpropertiesbetweenmbegrownbi1xsbx2se3topologicalinsulatorsandmagneticinsulatorcofe2o4
_version_ 1718388539649949696