RHEED analysis of the oxidized M′2M″xXyene sheets by ablated plasma thrust method in pulsed laser deposition chamber

M′2M″xXyene (M′ and M″ are the early transitional metals and X is carbide with x = 1 for y = 2 and x = 2 for y = 3) are the ordered double transitional metal layered carbides derived from their parent MAX phases M′2M″xAlXyene by a wet chemical etching method. Their oxides are predicted to have topol...

Descripción completa

Guardado en:

Detalles Bibliográficos
Autores principales:	D. Parajuli, K. C. Devendra, T. G. Reda, G. M. Sravani, N. Murali, K. Samatha
Formato:	article
Lenguaje:	EN
Publicado:	AIP Publishing LLC 2021
Materias:	Physics QC1-999
Acceso en línea:	https://doaj.org/article/bf1ca846f3b64cc0b92cd801df3a6d8e
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

id	oai:doaj.org-article:bf1ca846f3b64cc0b92cd801df3a6d8e
record_format	dspace
spelling	oai:doaj.org-article:bf1ca846f3b64cc0b92cd801df3a6d8e2021-12-01T18:52:06ZRHEED analysis of the oxidized M′2M″xXyene sheets by ablated plasma thrust method in pulsed laser deposition chamber2158-322610.1063/5.0068659https://doaj.org/article/bf1ca846f3b64cc0b92cd801df3a6d8e2021-11-01T00:00:00Zhttp://dx.doi.org/10.1063/5.0068659https://doaj.org/toc/2158-3226M′2M″xXyene (M′ and M″ are the early transitional metals and X is carbide with x = 1 for y = 2 and x = 2 for y = 3) are the ordered double transitional metal layered carbides derived from their parent MAX phases M′2M″xAlXyene by a wet chemical etching method. Their oxides are predicted to have topological properties for which they should be annealed at around 800 °C in an oxygen background. This paper includes the new ablated plasma thrust method for the ionization and adsorption of oxygen on the M′2M″xXyene substrate in the pulsed laser deposition chamber. We have found that the background pressure has a negative effect and the substrate temperature has a positive effect on plume expansion. The density profile of the background gas is highly affected by deposition temperature. Similarly, it is found that the density of plasma generated by longer wavelengths is not affected significantly due to the inverse bremsstrahlung process. A shorter wavelength produces the bremsstrahlung process as photoionization takes place. At a certain time (200 ns), the pressure of background gas and plasma pressure are equal (snow-plogh effect) so that all the wavelengths then produce electrons (highest for shorter wavelengths), thereby increasing its density. The energy necessary for the oxidation of the substrate is provided by the energy of the ablated species. The adsorption is assured by the reflective high electron energy diffraction technique, and it is found that the ambient gas pressures p = 0.1 mbar and 0.2 mbar are appropriate for the adsorption process. The obtained M′2M″xXyene oxides can be used for their topological test.D. ParajuliK. C. DevendraT. G. RedaG. M. SravaniN. MuraliK. SamathaAIP Publishing LLCarticlePhysicsQC1-999ENAIP Advances, Vol 11, Iss 11, Pp 115019-115019-11 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Physics QC1-999
spellingShingle	Physics QC1-999 D. Parajuli K. C. Devendra T. G. Reda G. M. Sravani N. Murali K. Samatha RHEED analysis of the oxidized M′2M″xXyene sheets by ablated plasma thrust method in pulsed laser deposition chamber
description	M′2M″xXyene (M′ and M″ are the early transitional metals and X is carbide with x = 1 for y = 2 and x = 2 for y = 3) are the ordered double transitional metal layered carbides derived from their parent MAX phases M′2M″xAlXyene by a wet chemical etching method. Their oxides are predicted to have topological properties for which they should be annealed at around 800 °C in an oxygen background. This paper includes the new ablated plasma thrust method for the ionization and adsorption of oxygen on the M′2M″xXyene substrate in the pulsed laser deposition chamber. We have found that the background pressure has a negative effect and the substrate temperature has a positive effect on plume expansion. The density profile of the background gas is highly affected by deposition temperature. Similarly, it is found that the density of plasma generated by longer wavelengths is not affected significantly due to the inverse bremsstrahlung process. A shorter wavelength produces the bremsstrahlung process as photoionization takes place. At a certain time (200 ns), the pressure of background gas and plasma pressure are equal (snow-plogh effect) so that all the wavelengths then produce electrons (highest for shorter wavelengths), thereby increasing its density. The energy necessary for the oxidation of the substrate is provided by the energy of the ablated species. The adsorption is assured by the reflective high electron energy diffraction technique, and it is found that the ambient gas pressures p = 0.1 mbar and 0.2 mbar are appropriate for the adsorption process. The obtained M′2M″xXyene oxides can be used for their topological test.
format	article
author	D. Parajuli K. C. Devendra T. G. Reda G. M. Sravani N. Murali K. Samatha
author_facet	D. Parajuli K. C. Devendra T. G. Reda G. M. Sravani N. Murali K. Samatha
author_sort	D. Parajuli
title	RHEED analysis of the oxidized M′2M″xXyene sheets by ablated plasma thrust method in pulsed laser deposition chamber
title_short	RHEED analysis of the oxidized M′2M″xXyene sheets by ablated plasma thrust method in pulsed laser deposition chamber
title_full	RHEED analysis of the oxidized M′2M″xXyene sheets by ablated plasma thrust method in pulsed laser deposition chamber
title_fullStr	RHEED analysis of the oxidized M′2M″xXyene sheets by ablated plasma thrust method in pulsed laser deposition chamber
title_full_unstemmed	RHEED analysis of the oxidized M′2M″xXyene sheets by ablated plasma thrust method in pulsed laser deposition chamber
title_sort	rheed analysis of the oxidized m′2m″xxyene sheets by ablated plasma thrust method in pulsed laser deposition chamber
publisher	AIP Publishing LLC
publishDate	2021
url	https://doaj.org/article/bf1ca846f3b64cc0b92cd801df3a6d8e
work_keys_str_mv	AT dparajuli rheedanalysisoftheoxidizedm2mxxyenesheetsbyablatedplasmathrustmethodinpulsedlaserdepositionchamber AT kcdevendra rheedanalysisoftheoxidizedm2mxxyenesheetsbyablatedplasmathrustmethodinpulsedlaserdepositionchamber AT tgreda rheedanalysisoftheoxidizedm2mxxyenesheetsbyablatedplasmathrustmethodinpulsedlaserdepositionchamber AT gmsravani rheedanalysisoftheoxidizedm2mxxyenesheetsbyablatedplasmathrustmethodinpulsedlaserdepositionchamber AT nmurali rheedanalysisoftheoxidizedm2mxxyenesheetsbyablatedplasmathrustmethodinpulsedlaserdepositionchamber AT ksamatha rheedanalysisoftheoxidizedm2mxxyenesheetsbyablatedplasmathrustmethodinpulsedlaserdepositionchamber
_version_	1718404718261174272

RHEED analysis of the oxidized M′2M″xXyene sheets by ablated plasma thrust method in pulsed laser deposition chamber

Ejemplares similares