Charge screening strategy for domain pattern control in nano-scale ferroelectric systems

Abstract Strain engineering is a widespread strategy used to enhance performance of devices based on semiconductor thin films. In ferroelectrics strain engineering is used to control the domain pattern: When an epitaxial film is biaxially compressed, e.g. due to lattice mismatch with the substrate,...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Tomoaki Yamada, Daisuke Ito, Tomas Sluka, Osami Sakata, Hidenori Tanaka, Hiroshi Funakubo, Takahiro Namazu, Naoki Wakiya, Masahito Yoshino, Takanori Nagasaki, Nava Setter
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2017
Materias:
R
Q
Acceso en línea:https://doaj.org/article/bf8ef723e26b4d1eb16e1242452238e4
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!

Ejemplares similares