Elliptic Arc Fitting for the Shape Control System of Silicon Single Crystal Growth

In the vision-based shape control system of silicon single crystal (SSC) growth, shape parameters are used as the control variables to make the grown SSC approximate to a perfect cylinder. A highlight halo at the junction of the solid crystal and the liquid crysta is a distinctive feature that refle...

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Autores principales: Pengliang Li, Ding Liu
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Lenguaje:EN
Publicado: IEEE 2020
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Acceso en línea:https://doaj.org/article/c09fc3e15d2d4521b6b6c2cd194ae970
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spelling oai:doaj.org-article:c09fc3e15d2d4521b6b6c2cd194ae9702021-11-11T00:01:11ZElliptic Arc Fitting for the Shape Control System of Silicon Single Crystal Growth2169-353610.1109/ACCESS.2020.2972612https://doaj.org/article/c09fc3e15d2d4521b6b6c2cd194ae9702020-01-01T00:00:00Zhttps://ieeexplore.ieee.org/document/8988234/https://doaj.org/toc/2169-3536In the vision-based shape control system of silicon single crystal (SSC) growth, shape parameters are used as the control variables to make the grown SSC approximate to a perfect cylinder. A highlight halo at the junction of the solid crystal and the liquid crysta is a distinctive feature that reflects the current shape of SSC, and the edge of the captured halo is an elliptic arc that consistently changes with the shape of the halo. To estimate the shape parameters through the elliptic arc, we propose a two-side (TS) constraint method to fit the elliptic arc. Firstly, the error correction parameter is introduced into the second-order polynomial model to make the model more robust in the case of noise disturbing, and the resultant non-convex TS constraint model is constructed. Then, two weighted functions, which give the data out of TS constraint a small weight coefficient to resist the large level noise disturbing, are brought into the TS constraint optimization problem tactfully. Simulation and real SSC data examples show that the proposed method can obtain the elliptic arc parameters effectively.Pengliang LiDing LiuIEEEarticleSilicon single crystalelliptic arc fittingtwo-side constraintnon-convex optimizationElectrical engineering. Electronics. Nuclear engineeringTK1-9971ENIEEE Access, Vol 8, Pp 28979-28987 (2020)
institution DOAJ
collection DOAJ
language EN
topic Silicon single crystal
elliptic arc fitting
two-side constraint
non-convex optimization
Electrical engineering. Electronics. Nuclear engineering
TK1-9971
spellingShingle Silicon single crystal
elliptic arc fitting
two-side constraint
non-convex optimization
Electrical engineering. Electronics. Nuclear engineering
TK1-9971
Pengliang Li
Ding Liu
Elliptic Arc Fitting for the Shape Control System of Silicon Single Crystal Growth
description In the vision-based shape control system of silicon single crystal (SSC) growth, shape parameters are used as the control variables to make the grown SSC approximate to a perfect cylinder. A highlight halo at the junction of the solid crystal and the liquid crysta is a distinctive feature that reflects the current shape of SSC, and the edge of the captured halo is an elliptic arc that consistently changes with the shape of the halo. To estimate the shape parameters through the elliptic arc, we propose a two-side (TS) constraint method to fit the elliptic arc. Firstly, the error correction parameter is introduced into the second-order polynomial model to make the model more robust in the case of noise disturbing, and the resultant non-convex TS constraint model is constructed. Then, two weighted functions, which give the data out of TS constraint a small weight coefficient to resist the large level noise disturbing, are brought into the TS constraint optimization problem tactfully. Simulation and real SSC data examples show that the proposed method can obtain the elliptic arc parameters effectively.
format article
author Pengliang Li
Ding Liu
author_facet Pengliang Li
Ding Liu
author_sort Pengliang Li
title Elliptic Arc Fitting for the Shape Control System of Silicon Single Crystal Growth
title_short Elliptic Arc Fitting for the Shape Control System of Silicon Single Crystal Growth
title_full Elliptic Arc Fitting for the Shape Control System of Silicon Single Crystal Growth
title_fullStr Elliptic Arc Fitting for the Shape Control System of Silicon Single Crystal Growth
title_full_unstemmed Elliptic Arc Fitting for the Shape Control System of Silicon Single Crystal Growth
title_sort elliptic arc fitting for the shape control system of silicon single crystal growth
publisher IEEE
publishDate 2020
url https://doaj.org/article/c09fc3e15d2d4521b6b6c2cd194ae970
work_keys_str_mv AT pengliangli ellipticarcfittingfortheshapecontrolsystemofsiliconsinglecrystalgrowth
AT dingliu ellipticarcfittingfortheshapecontrolsystemofsiliconsinglecrystalgrowth
_version_ 1718439623530643456