Cleaning interfaces in layered materials heterostructures
Atomically-clean interfaces are required in heterostructures. Here, authors report a method for fast and parallel removal of contaminants from fully-formed heterostructures, including sample intentionally exposed to polymers and solvent, achieving room temperature mobility over 180,000 cm2/Vs for gr...
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| Auteurs principaux: | , , , , , |
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| Format: | article |
| Langue: | EN |
| Publié: |
Nature Portfolio
2018
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| Sujets: | |
| Accès en ligne: | https://doaj.org/article/c0f384b42b4e480193398d58cac1ddfe |
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| Résumé: | Atomically-clean interfaces are required in heterostructures. Here, authors report a method for fast and parallel removal of contaminants from fully-formed heterostructures, including sample intentionally exposed to polymers and solvent, achieving room temperature mobility over 180,000 cm2/Vs for graphene. |
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