Study on scattering light field distribution of optical element in-surface defects based on Mueller matrix
For precise optical elements, the size of in-surface defects is at the nanometer scale. When incident light illuminates in-surface defects on optical elements, strong diffraction and scattering effects are produced, and this greatly reduces the beam quality in optical systems. In this study, a three...
Guardado en:
| Autores principales: | , , , , , |
|---|---|
| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
AIP Publishing LLC
2021
|
| Materias: | |
| Acceso en línea: | https://doaj.org/article/c1577f932cbe4608a5d74fe6feafdbed |
| Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
| Sumario: | For precise optical elements, the size of in-surface defects is at the nanometer scale. When incident light illuminates in-surface defects on optical elements, strong diffraction and scattering effects are produced, and this greatly reduces the beam quality in optical systems. In this study, a three-dimensional model of the in-surface defects of K9 optical components was established. On this basis, a theoretical model of electromagnetic scattering between the defect and the incident and scattering fields was constructed. The 4 × 4-order scattering Mueller matrix light field distributions of incident light modulated by different-sized defects were obtained by numerical simulations, and the influencing factors were analyzed. These simulations provide a theoretical basis and a reference for the manufacture of precision optical elements and a scale calibration for surface quality detection methods. |
|---|