Study on scattering light field distribution of optical element in-surface defects based on Mueller matrix

For precise optical elements, the size of in-surface defects is at the nanometer scale. When incident light illuminates in-surface defects on optical elements, strong diffraction and scattering effects are produced, and this greatly reduces the beam quality in optical systems. In this study, a three...

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Autores principales:	Hongjun Wang, Yingge Zhang, Dasen Wang, Bingcai Liu, Xueliang Zhu, Ailing Tian
Formato:	article
Lenguaje:	EN
Publicado:	AIP Publishing LLC 2021
Materias:	Physics QC1-999
Acceso en línea:	https://doaj.org/article/c1577f932cbe4608a5d74fe6feafdbed
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spelling	oai:doaj.org-article:c1577f932cbe4608a5d74fe6feafdbed2021-12-01T18:52:06ZStudy on scattering light field distribution of optical element in-surface defects based on Mueller matrix2158-322610.1063/5.0044002https://doaj.org/article/c1577f932cbe4608a5d74fe6feafdbed2021-11-01T00:00:00Zhttp://dx.doi.org/10.1063/5.0044002https://doaj.org/toc/2158-3226For precise optical elements, the size of in-surface defects is at the nanometer scale. When incident light illuminates in-surface defects on optical elements, strong diffraction and scattering effects are produced, and this greatly reduces the beam quality in optical systems. In this study, a three-dimensional model of the in-surface defects of K9 optical components was established. On this basis, a theoretical model of electromagnetic scattering between the defect and the incident and scattering fields was constructed. The 4 × 4-order scattering Mueller matrix light field distributions of incident light modulated by different-sized defects were obtained by numerical simulations, and the influencing factors were analyzed. These simulations provide a theoretical basis and a reference for the manufacture of precision optical elements and a scale calibration for surface quality detection methods.Hongjun WangYingge ZhangDasen WangBingcai LiuXueliang ZhuAiling TianAIP Publishing LLCarticlePhysicsQC1-999ENAIP Advances, Vol 11, Iss 11, Pp 115114-115114-9 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Physics QC1-999
spellingShingle	Physics QC1-999 Hongjun Wang Yingge Zhang Dasen Wang Bingcai Liu Xueliang Zhu Ailing Tian Study on scattering light field distribution of optical element in-surface defects based on Mueller matrix
description	For precise optical elements, the size of in-surface defects is at the nanometer scale. When incident light illuminates in-surface defects on optical elements, strong diffraction and scattering effects are produced, and this greatly reduces the beam quality in optical systems. In this study, a three-dimensional model of the in-surface defects of K9 optical components was established. On this basis, a theoretical model of electromagnetic scattering between the defect and the incident and scattering fields was constructed. The 4 × 4-order scattering Mueller matrix light field distributions of incident light modulated by different-sized defects were obtained by numerical simulations, and the influencing factors were analyzed. These simulations provide a theoretical basis and a reference for the manufacture of precision optical elements and a scale calibration for surface quality detection methods.
format	article
author	Hongjun Wang Yingge Zhang Dasen Wang Bingcai Liu Xueliang Zhu Ailing Tian
author_facet	Hongjun Wang Yingge Zhang Dasen Wang Bingcai Liu Xueliang Zhu Ailing Tian
author_sort	Hongjun Wang
title	Study on scattering light field distribution of optical element in-surface defects based on Mueller matrix
title_short	Study on scattering light field distribution of optical element in-surface defects based on Mueller matrix
title_full	Study on scattering light field distribution of optical element in-surface defects based on Mueller matrix
title_fullStr	Study on scattering light field distribution of optical element in-surface defects based on Mueller matrix
title_full_unstemmed	Study on scattering light field distribution of optical element in-surface defects based on Mueller matrix
title_sort	study on scattering light field distribution of optical element in-surface defects based on mueller matrix
publisher	AIP Publishing LLC
publishDate	2021
url	https://doaj.org/article/c1577f932cbe4608a5d74fe6feafdbed
work_keys_str_mv	AT hongjunwang studyonscatteringlightfielddistributionofopticalelementinsurfacedefectsbasedonmuellermatrix AT yinggezhang studyonscatteringlightfielddistributionofopticalelementinsurfacedefectsbasedonmuellermatrix AT dasenwang studyonscatteringlightfielddistributionofopticalelementinsurfacedefectsbasedonmuellermatrix AT bingcailiu studyonscatteringlightfielddistributionofopticalelementinsurfacedefectsbasedonmuellermatrix AT xueliangzhu studyonscatteringlightfielddistributionofopticalelementinsurfacedefectsbasedonmuellermatrix AT ailingtian studyonscatteringlightfielddistributionofopticalelementinsurfacedefectsbasedonmuellermatrix
_version_	1718404652890849280

Study on scattering light field distribution of optical element in-surface defects based on Mueller matrix

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