Selective phase growth and precise-layer control in MoTe2

The polymorphism of MoTe2 can be used to realize planar metallic/semiconducting homojunctions in 2D devices, greatly reducing the contact resistance. Here, the simultaneous growth of both phases is achieved on the same substrate by single-step chemical vapor deposition and seeding layer engineering.

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Autores principales: James P. Fraser, Liudvika Masaityte, Jingyi Zhang, Stacey Laing, Juan Carlos Moreno-López, Adam F. McKenzie, Jessica C. McGlynn, Vishal Panchal, Duncan Graham, Olga Kazakova, Thomas Pichler, Donald A. MacLaren, David A. J. Moran, Alexey Y. Ganin
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Lenguaje:EN
Publicado: Nature Portfolio 2020
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Acceso en línea:https://doaj.org/article/c974631d39364eaaac5f9c811e2a0d41
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spelling oai:doaj.org-article:c974631d39364eaaac5f9c811e2a0d412021-12-02T16:26:29ZSelective phase growth and precise-layer control in MoTe210.1038/s43246-020-00048-42662-4443https://doaj.org/article/c974631d39364eaaac5f9c811e2a0d412020-07-01T00:00:00Zhttps://doi.org/10.1038/s43246-020-00048-4https://doaj.org/toc/2662-4443The polymorphism of MoTe2 can be used to realize planar metallic/semiconducting homojunctions in 2D devices, greatly reducing the contact resistance. Here, the simultaneous growth of both phases is achieved on the same substrate by single-step chemical vapor deposition and seeding layer engineering.James P. FraserLiudvika MasaityteJingyi ZhangStacey LaingJuan Carlos Moreno-LópezAdam F. McKenzieJessica C. McGlynnVishal PanchalDuncan GrahamOlga KazakovaThomas PichlerDonald A. MacLarenDavid A. J. MoranAlexey Y. GaninNature PortfolioarticleMaterials of engineering and construction. Mechanics of materialsTA401-492ENCommunications Materials, Vol 1, Iss 1, Pp 1-9 (2020)
institution DOAJ
collection DOAJ
language EN
topic Materials of engineering and construction. Mechanics of materials
TA401-492
spellingShingle Materials of engineering and construction. Mechanics of materials
TA401-492
James P. Fraser
Liudvika Masaityte
Jingyi Zhang
Stacey Laing
Juan Carlos Moreno-López
Adam F. McKenzie
Jessica C. McGlynn
Vishal Panchal
Duncan Graham
Olga Kazakova
Thomas Pichler
Donald A. MacLaren
David A. J. Moran
Alexey Y. Ganin
Selective phase growth and precise-layer control in MoTe2
description The polymorphism of MoTe2 can be used to realize planar metallic/semiconducting homojunctions in 2D devices, greatly reducing the contact resistance. Here, the simultaneous growth of both phases is achieved on the same substrate by single-step chemical vapor deposition and seeding layer engineering.
format article
author James P. Fraser
Liudvika Masaityte
Jingyi Zhang
Stacey Laing
Juan Carlos Moreno-López
Adam F. McKenzie
Jessica C. McGlynn
Vishal Panchal
Duncan Graham
Olga Kazakova
Thomas Pichler
Donald A. MacLaren
David A. J. Moran
Alexey Y. Ganin
author_facet James P. Fraser
Liudvika Masaityte
Jingyi Zhang
Stacey Laing
Juan Carlos Moreno-López
Adam F. McKenzie
Jessica C. McGlynn
Vishal Panchal
Duncan Graham
Olga Kazakova
Thomas Pichler
Donald A. MacLaren
David A. J. Moran
Alexey Y. Ganin
author_sort James P. Fraser
title Selective phase growth and precise-layer control in MoTe2
title_short Selective phase growth and precise-layer control in MoTe2
title_full Selective phase growth and precise-layer control in MoTe2
title_fullStr Selective phase growth and precise-layer control in MoTe2
title_full_unstemmed Selective phase growth and precise-layer control in MoTe2
title_sort selective phase growth and precise-layer control in mote2
publisher Nature Portfolio
publishDate 2020
url https://doaj.org/article/c974631d39364eaaac5f9c811e2a0d41
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