Electron-beam-irradiated rhenium disulfide memristors with low variability for neuromorphic computing

Abstract State-of-the-art memristors are mostly formed by vertical metal–insulator–metal (MIM) structure, which rely on the formation of conductive filaments for resistive switching (RS). However, owing to the stochastic formation of filament, the set/reset voltage of vertical MIM memristors is diff...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Sifan Li, Bochang Li, Xuewei Feng, Li Chen, Yesheng Li, Li Huang, Xuanyao Fong, Kah-Wee Ang
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2021
Materias:
Acceso en línea:https://doaj.org/article/cf214c11237f4ba4ab2322a3ed1c0b56
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!

Ejemplares similares